Undulational instabilities of smectic thin films on heterogeneous patterned surfaces under positive and negative strain: The case of diblock copolymers

1999 ◽  
Vol 110 (18) ◽  
pp. 9223-9229 ◽  
Author(s):  
G. G. Pereira ◽  
D. R. M. Williams
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Patterned Surfaces

Nanoporous Thin Films Formed from Photocleavable Diblock Copolymers on Gold Substrates Modified with Thiolate Self-Assembled Monolayers

Langmuir ◽  
2020 ◽  
Vol 36 (31) ◽  
pp. 9259-9268 ◽  
Author(s):  
Takashi Ito ◽  
Herman Coceancigh ◽  
Yi Yi ◽  
Jay N. Sharma ◽  
Fred C. Parks ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Self Assembled Monolayers ◽  
Gold Substrates ◽  
Assembled Monolayers ◽  
Self Assembled

Array of Fe3O4 Nanoparticles in PS-b-P2VP thin Films

2013 ◽  
Vol 345 ◽  
pp. 193-196
Author(s):  
Xin Kang Gao ◽  
Jun Liu ◽  
Ting Hua Wang ◽  
Xue Li ◽  
Xiao Kai Zhang
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Composite Film ◽  
Self Assembly ◽  
Spin Coating ◽  
Diblock Copolymers ◽  
Carbon Substrate ◽  
Mixed Solution ◽  
Long Time ◽  
Oriented Parallel

In this study, a method to generate arrays of Fe3O4 nanoparticles (MNPs) via block copolymer (BC) self-assembly was developed. A composite film of polystyrene-block-poly (2-vinylpyridine) (PS-b-P2VP)/MNPs was first prepared by spin-coating the PS-b-P2VP/MNPs mixed solution on a carbon substrate. After the composite film was annealed at high temperature for 2 days, it was found that the modified MNPs could be selectively incorporated into P2VP cylinders in PS-b-P2VP diblock copolymers and the P2VP cylinders were oriented parallel to the substrate. For a long time annealing (10 days), the P2VP cylinders become normal to the substrate and MNPs are located at the interface of P2VP and PS phases.

Shear-induced parallel and transverse alignments of cylinders in thin films of diblock copolymers

Soft Matter ◽  
2018 ◽  
Vol 14 (32) ◽  
pp. 6635-6647 ◽  
Author(s):  
Yulong Chen ◽  
Qian Xu ◽  
Yangfu Jin ◽  
Xin Qian ◽  
Rui Ma ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Underlying Mechanisms

Shear-induced parallel and transverse alignments of cylinders in thin films of diblock copolymers and their underlying mechanisms were studied by simulations.

scholarly journals Hierarchical Order in Dewetted Block Copolymer Thin Films on Chemically Patterned Surfaces

ACS Nano ◽  
2018 ◽  
Vol 12 (7) ◽  
pp. 7076-7085 ◽  
Author(s):  
Federico Ferrarese Lupi ◽  
Tommaso Jacopo Giammaria ◽  
Andrea Miti ◽  
Giampaolo Zuccheri ◽  
Stefano Carignano ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Patterned Surfaces ◽  
Hierarchical Order ◽  
Chemically Patterned Surfaces

Self-Assembly in Thin Films during Copolymerization on Patterned Surfaces

2013 ◽  
Vol 46 (11) ◽  
pp. 4684-4690 ◽  
Author(s):  
Alexey A. Gavrilov ◽  
Alexander V. Chertovich
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Patterned Surfaces

Nanostructured organic radical cathodes from self-assembled nitroxide-containing block copolymer thin films

2015 ◽  
Vol 3 (38) ◽  
pp. 19575-19581 ◽  
Author(s):  
G. Hauffman ◽  
A. Vlad ◽  
T. Janoschka ◽  
U. S. Schubert ◽  
J.-F. Gohy
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Block Copolymer ◽  
Diblock Copolymers ◽  
Organic Radical ◽  
Nanostructured Thin Film ◽  
Self Assembled

Nanostructured thin film organic radical cathodes have been prepared from poly(styrene)-block-poly(2,2,6,6-tetramethylpiperidinyloxy-4-yl methacrylate) diblock copolymers.

Nanostructure- and Orientation-Controlled Digital Memory Behaviors of Linear-Brush Diblock Copolymers in Nanoscale Thin Films

2014 ◽  
Vol 47 (13) ◽  
pp. 4397-4407 ◽  
Author(s):  
Kyungtae Kim ◽  
Young Yong Kim ◽  
Samdae Park ◽  
Yong-Gi Ko ◽  
Yecheol Rho ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymers ◽  
Digital Memory
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