scholarly journals Kinetics of color center formation in silica irradiated with swift heavy ions: Thresholding and formation efficiency

2012 ◽  
Vol 101 (15) ◽  
pp. 154103 ◽  
Author(s):  
J. Manzano-Santamaría ◽  
J. Olivares ◽  
A. Rivera ◽  
O. Peña-Rodríguez ◽  
F. Agulló-López
2004 ◽  
Vol 70 (18) ◽  
Author(s):  
K. Schwartz ◽  
C. Trautmann ◽  
A. S. El-Said ◽  
R. Neumann ◽  
M. Toulemonde ◽  
...  

2017 ◽  
Vol 140 ◽  
pp. 157-167 ◽  
Author(s):  
C. Grygiel ◽  
F. Moisy ◽  
M. Sall ◽  
H. Lebius ◽  
E. Balanzat ◽  
...  

2012 ◽  
Vol 33 (10) ◽  
pp. 1049-1054
Author(s):  
宋银 SONG Yin ◽  
孟彦成 MENG Yan-cheng ◽  
张崇宏 ZHANG Chong-hong ◽  
杨义涛 YANG Yi-tao ◽  
李锦钰 LI Jin-yu ◽  
...  

2012 ◽  
Vol 430 (1-3) ◽  
pp. 125-131 ◽  
Author(s):  
O. Peña-Rodríguez ◽  
J. Manzano-Santamaría ◽  
A. Rivera ◽  
G. García ◽  
J. Olivares ◽  
...  

2013 ◽  
Vol 35 (5) ◽  
pp. 1057-1061 ◽  
Author(s):  
Yin Song ◽  
Chong-hong Zhang ◽  
Yi-tao Yang ◽  
Jie Gou ◽  
Li-qing Zhang ◽  
...  

2021 ◽  
Vol 4 (1) ◽  
Author(s):  
Miguel C. Sequeira ◽  
Jean-Gabriel Mattei ◽  
Henrique Vazquez ◽  
Flyura Djurabekova ◽  
Kai Nordlund ◽  
...  

AbstractGaN is the most promising upgrade to the traditional Si-based radiation-hard technologies. However, the underlying mechanisms driving its resistance are unclear, especially for strongly ionising radiation. Here, we use swift heavy ions to show that a strong recrystallisation effect induced by the ions is the key mechanism behind the observed resistance. We use atomistic simulations to examine and predict the damage evolution. These show that the recrystallisation lowers the expected damage levels significantly and has strong implications when studying high fluences for which numerous overlaps occur. Moreover, the simulations reveal structures such as point and extended defects, density gradients and voids with excellent agreement between simulation and experiment. We expect that the developed modelling scheme will contribute to improving the design and test of future radiation-resistant GaN-based devices.


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