Nonvolatile memory thin film transistors using CdSe/ZnS quantum dot-poly(methyl methacrylate) composite layer formed by a two-step spin coating technique

2012 ◽  
Vol 112 (3) ◽  
pp. 034518 ◽  
Author(s):  
Ying-Chih Chen ◽  
Chun-Yuan Huang ◽  
Hsin-Chieh Yu ◽  
Yan-Kuin Su
Keyword(s):  
Thin Film ◽  
Quantum Dot ◽  
Methyl Methacrylate ◽  
Spin Coating ◽  
Thin Film Transistors ◽  
Nonvolatile Memory ◽  
Composite Layer ◽  
Spin Coating Technique ◽  
Poly Methyl Methacrylate ◽  
Coating Technique

scholarly journals PREPARATION OF POLY (METHYL METHACRYLATE) THIN FILMS BY SPIN COATING TECHNIQUE FOR OTFT AND WOUND HEALING APPLICATIONS

2018 ◽  
Vol 5 (1) ◽  
pp. 20-22
Author(s):  
Chandar Shekar B ◽  
Ranjit Kumar R ◽  
Dinesh K.P.B ◽  
Sulana Sundari C ◽  
Punithavathi K
Keyword(s):  
Thin Films ◽  
Methyl Methacrylate ◽  
Spin Coating ◽  
Thin Film Transistors ◽  
Amorphous Structure ◽  
Spin Coating Technique ◽  
Prepared Film ◽  
Poly Methyl Methacrylate ◽  
Coating Technique ◽  
Glass Slides

Thin films of poly (methyl methacrylate) (PMMA) were prepared on cleaned glass slides by using spin coating technique. The prepared films were identified by using FTIR spectrum. Surface morphology of the coated films was studied by using SEM and AFM. Both as grown and annealed films showed smooth and amorphous structure. It also revealed the absence of pits, pin holes and dendritic features in the surface. Both as grown and annealed films showed very low RMS roughness value. The morphology analysis revealed that the prepared film could be used as dielectric layer in thin film transistors and as drug delivery system forwound healing.

Environmental effects on the electrical behavior of pentacene thin-film transistors with a poly(methyl methacrylate) gate insulator

2013 ◽  
Vol 14 (9) ◽  
pp. 2101-2107 ◽  
Author(s):  
Jaehoon Park ◽  
Lee-Mi Do ◽  
Jin-Hyuk Bae ◽  
Ye-Sul Jeong ◽  
Christopher Pearson ◽  
...  
Keyword(s):  
Thin Film ◽  
Methyl Methacrylate ◽  
Environmental Effects ◽  
Thin Film Transistors ◽  
Gate Insulator ◽  
Electrical Behavior ◽  
Poly Methyl Methacrylate

Photoconductivity of Nanocomposite MEH-PPV: TiO2 Thin Films

2011 ◽  
Vol 13 ◽  
pp. 87-92 ◽  
Author(s):  
M.S.P Sarah ◽  
F.S. Zahid ◽  
M.Z. Musa ◽  
U.M. Noor ◽  
Z. Shaameri ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Morphology ◽  
Spin Coating ◽  
Glass Substrate ◽  
Spin Coating Technique ◽  
Coating Technique ◽  
Current Voltage ◽  
Current Voltage Characteristics

The photoconductivity of a nanocomposite MEH-PPV:TiO2 thin film is investigated. The nanocomposite MEH-PPV:TiO2 thin film was deposited on a glass substrate by spin coating technique. The composition of the TiO2 powder was varied from 5 wt% to 20 wt% (with 5 wt% interval). The concentration of the MEH-PPV is given by 1 mg/1 ml. The current voltage characteristics were measured in dark and under illumination. The photoconductivity showed increment in value as the composition of the TiO2 is raised in the polymer based solution. The absorption showed augmentation as the amount of TiO2 is increased. The escalation of the current voltage is then supported by the results of surface morphology.

Polycrystalline BiFeO3 thin film synthesized via sol-gel assisted spin coating technique for photosensitive application

2016 ◽  
Author(s):  
K. A. Bogle ◽  
R. D. Narwade ◽  
A. B. Phatangare ◽  
S. S. Dahiwale ◽  
M. P. Mahabole ◽  
...  
Keyword(s):  
Thin Film ◽  
Spin Coating ◽  
Sol Gel ◽  
Spin Coating Technique ◽  
Bifeo3 Thin Film ◽  
Coating Technique

Linear, third order nonlinear and optical limiting studies on MZO/FTO thin film system fabricated by spin coating technique for electro-optic applications

2018 ◽  
Vol 33 (22) ◽  
pp. 3880-3889 ◽  
Author(s):  
Mohd. Shkir ◽  
Mohd. Arif ◽  
Vanga Ganesh ◽  
Mohamed A. Manthrammel ◽  
Arun Singh ◽  
...  
Keyword(s):  
Thin Film ◽  
Spin Coating ◽  
Optical Limiting ◽  
Spin Coating Technique ◽  
Film System ◽  
Third Order ◽  
Coating Technique ◽  
Thin Film System ◽  
Electro Optic ◽  
Image Position

Abstract

scholarly journals Growth of Tin Oxide Thin Film by Aluminum and Fluorine Doping Using Spin Coating Sol-Gel Techniques

2019 ◽  
Vol 6 (1) ◽  
pp. 1
Author(s):  
Susilawati Susilawati ◽  
Aris Doyan ◽  
Lalu Muliyadi ◽  
Syamsul Hakim
Keyword(s):  
Thin Film ◽  
Thin Layer ◽  
Tin Oxide ◽  
Spin Coating ◽  
Sol Gel ◽  
Spin Coating Technique ◽  
Oxide Thin Film ◽  
Coating Technique ◽  
Materials Used ◽  
Film Making

Abstract: The growth of tin oxide thin film by Aluminum doping and Fluorine has been carried out with the sol-gel spin coating technique. The growth aims to determine the quality of the thin layer formed based on variations in doping aluminum and fluorine. The basic ingredients used were SnCl2.2H2O, while the doping materials used were Al (Aluminium) and F (Fluorine) with variations in dopant concentrations (0, 5, 10, 15, 20 and 25)%. The growth of a thin layer using measured glass (10x10x 3) mm as a substrate. The growth of thin films includes substrate preparation, sol-gel making, thin film making, and heating processes. The growth of thin layer was dripped on a glass substrate with sol-gel spin coating technique at 1 M sol concentration and treated with maturation for 24 hours. The next step is making a thin layer using a spin coater at a speed of 2000 rpm for 3 minutes. After that, the substrate is heated in an oven at 100°C for 60 minutes. The results showed that the transparency level of the tin oxide layer increases with increasing amounts of doping Aluminum and fluorine. Key words: Aluminum, Fluorine, Sol-gel, Spin Coating, Thin Film, Tin Oxide

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