Molecular beam study of the collisions of state-monitored, metastable noble gas atoms with O2(X 3Σg−)

1997 ◽  
Vol 106 (8) ◽  
pp. 3135-3145 ◽  
Author(s):  
Dawn Rickey ◽  
John Krenos
Keyword(s):  
2019 ◽  
Vol 21 (14) ◽  
pp. 7330-7340 ◽  
Author(s):  
Francesca Nunzi ◽  
Diego Cesario ◽  
Leonardo Belpassi ◽  
Francesco Tarantelli ◽  
Luiz F. Roncaratti ◽  
...  

A weak halogen bond, together with charge transfer from a noble gas to Cl2, characterizes the intermolecular interaction between a noble gas atom and Cl2 in a collinear configuration.


1986 ◽  
Vol 90 (21) ◽  
pp. 5121-5130 ◽  
Author(s):  
D. R. Worsnop ◽  
S. J. Buelow ◽  
D. R. Herschbach

1975 ◽  
Vol 53 (5) ◽  
pp. 435-444 ◽  
Author(s):  
R. W. Bickes Jr. ◽  
G. Scoles ◽  
K. M. Smith

Differential collision cross sections for H2–noble gas pairs have been measured and analyzed via a best fit procedure. The data are well described by Lennard–Jones (12,6) (LJ) and Buckingham–Corner (BC) potentials and yield model independent values for σ, the location of the zero of the potential. For H2–Ne, H2–Ar, and H2–Kr, σ values are respectively 2.85, 3.07, and 3.21 Å, with uncertainties [Formula: see text].


Author(s):  
D.A. Thompson ◽  
D.B. Mitchell ◽  
B.J. Robinson ◽  
R.R. LaPierre ◽  
P Mascher

2019 ◽  
Vol 7 ◽  
Author(s):  
David Cappelletti ◽  
Antonio Cinti ◽  
Andrea Nicoziani ◽  
Stefano Falcinelli ◽  
Fernando Pirani

2011 ◽  
Vol 135 (19) ◽  
pp. 194301 ◽  
Author(s):  
Fernando Pirani ◽  
Luiz F. Roncaratti ◽  
Leonardo Belpassi ◽  
Francesco Tarantelli ◽  
D. Cappelletti

Author(s):  
C.B. Carter ◽  
D.M. DeSimone ◽  
T. Griem ◽  
C.E.C. Wood

Molecular-beam epitaxy (MBE) is potentially an extremely valuable tool for growing III-V compounds. The value of the technique results partly from the ease with which controlled layers of precisely determined composition can be grown, and partly from the ability that it provides for growing accurately doped layers.


Author(s):  
M. G. Lagally

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.


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