The charge trapping characteristics of Si3N4 and Al2O3 layers on amorphous-indium-gallium-zinc oxide thin films for memory application

2012 ◽  
Vol 100 (18) ◽  
pp. 183503 ◽  
Author(s):  
Ji Sim Jung ◽  
Sang-Ho Rha ◽  
Un Ki Kim ◽  
Yoon Jang Chung ◽  
Yoon Soo Jung ◽  
...  
2012 ◽  
Vol 14 (10) ◽  
pp. 915-918 ◽  
Author(s):  
Yanbin Zheng ◽  
Guang Li ◽  
Wenlong Wang ◽  
Xiuchang Li ◽  
Zhigang Jiang

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