scholarly journals Design and characterization of very high frequency pulse tube prototypes

2012 ◽  
Author(s):  
Diogo Lopes ◽  
Jean-Marc Duval ◽  
Ivan Charles ◽  
James Butterworth ◽  
Thierry Trollier ◽  
...  
Keyword(s):  
High Frequency ◽  
Pulse Tube ◽  
Very High Frequency ◽  
Very High ◽  
Frequency Pulse

Atomic fountain clock with very high frequency stability employing a pulse-tube-cryocooled sapphire oscillator

2014 ◽  
Vol 61 (9) ◽  
pp. 1463-1469 ◽  
Author(s):  
Akifumi Takamizawa ◽  
Shinya Yanagimachi ◽  
Takehiko Tanabe ◽  
Ken Hagimoto ◽  
Iku Hirano ◽  
...  
Keyword(s):  
High Frequency ◽  
Frequency Stability ◽  
Pulse Tube ◽  
Very High Frequency ◽  
Atomic Fountain ◽  
Very High

Fabrication and Characterization of Cold Electron Emitter Based on Nanocrystalline Silicon Dots

2000 ◽  
Vol 638 ◽  
Author(s):  
K. Nishiguchi ◽  
X. Zhao ◽  
S. Oda
Keyword(s):  
Gas Phase ◽  
High Frequency ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Cold Electron ◽  
Very High Frequency ◽  
Electron Emitter ◽  
Fabrication And Characterization ◽  
Very High

AbstractA cold electron emitter has been made from nanocrystalline silicon (nc-Si) dots. Nc-Si dots are formed in the gas phase by very-high-frequency (VHF) plasma enhanced chemical vapor deposition (CVD). Electrons, accelerated by electric field, are ballistically transported through nc-Si and SiO2, then extracted into vacuum. Electron emission efficiency is optimized through varying nc-Si film thickness, surface roughness, and by short thermal oxidation.

Characterization of High-Rate Deposited Microcrystalline Si Films Prepared using Atmospheric-Pressure Very High-Frequency Plasma

2019 ◽  
Vol 25 (8) ◽  
pp. 405-412
Author(s):  
Keita Tabuchi ◽  
Kentato Ouchi ◽  
Hiromasa Ohmi ◽  
Hiroaki Kakiuchi ◽  
Kiyoshi Yasutake
Keyword(s):  
Atmospheric Pressure ◽  
High Frequency ◽  
High Rate ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Si Films ◽  
Very High
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