Evidence for stepwise dissociation dynamics in acetone at 248 and 193 nm

1995 ◽  
Vol 102 (11) ◽  
pp. 4447-4460 ◽  
Author(s):  
Simon W. North ◽  
David A. Blank ◽  
J. Daniel Gezelter ◽  
Cheryl A. Longfellow ◽  
Yuan T. Lee
Keyword(s):  
Dissociation Dynamics ◽  
193 Nm ◽  
Stepwise Dissociation

scholarly journals Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm

2019 ◽  
Vol 151 (17) ◽  
pp. 174303
Author(s):  
Erin N. Sullivan ◽  
Bethan Nichols ◽  
Stephen von Kugelgen ◽  
Gabriel da Silva ◽  
Daniel M. Neumark
Keyword(s):  
Dissociation Dynamics ◽  
Multiphoton Dissociation ◽  
193 Nm

Dissociation dynamics of thiolactic acid at 193 nm: Detection of the nascent OH product by laser-induced fluorescence

2004 ◽  
Vol 120 (15) ◽  
pp. 6964-6972 ◽  
Author(s):  
Kumbil K. Pushpa ◽  
Hari P. Upadhyaya ◽  
Awadhesh Kumar ◽  
Prakash D. Naik ◽  
Paramanand Bajaj ◽  
...  
Keyword(s):  
Laser Induced Fluorescence ◽  
Dissociation Dynamics ◽  
193 Nm

Imaging the dissociation dynamics of Si2+ via two-photon excitation at 193 nm

2019 ◽  
Vol 32 (1) ◽  
pp. 129-133 ◽  
Author(s):  
Yu-jie Ma ◽  
Fang-fang Li ◽  
Jia-xing Liu ◽  
Feng-yan Wang
Keyword(s):  
Two Photon ◽  
Photon Excitation ◽  
Dissociation Dynamics ◽  
193 Nm ◽  
Two Photon Excitation

Dissociation dynamics of CH3SH at 222, 248, and 193 nm: An analog for probing nonadiabaticity in the transition state region of bimolecular reactions

1993 ◽  
Vol 98 (4) ◽  
pp. 2882-2890 ◽  
Author(s):  
E. Jensen ◽  
J. S. Keller ◽  
G. C. G. Waschewsky ◽  
J. E. Stevens ◽  
R. L. Graham ◽  
...  
Keyword(s):  
Transition State ◽  
Bimolecular Reactions ◽  
Dissociation Dynamics ◽  
State Region ◽  
193 Nm

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm

Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

2012 ◽  
Vol 447 (1) ◽  
pp. 267-272 ◽  
Author(s):  
N. N. Vtyurina ◽  
S. L. Grohovsky ◽  
A. B. Vasiliev ◽  
I. I. Titov ◽  
P. M. Ponomarenko ◽  
...  
Keyword(s):  
Dna Damage ◽  
Laser Beam ◽  
Ultraviolet Laser ◽  
193 Nm

C–Br bond rupture in 193 nm photodissociation of vinyl bromide

1998 ◽  
Vol 231 (2-3) ◽  
pp. 345-353 ◽  
Author(s):  
Hideki Katayanagi ◽  
Nobuaki Yonekuira ◽  
Toshinori Suzuki
Keyword(s):  
Bond Rupture ◽  
Vinyl Bromide ◽  
193 Nm
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