Cation dependence of the vibrational and rotational relaxation of OH− ion in molten MOH(M=Li, Na, K, Rb, and Cs) by Raman scattering measurements

1991 ◽  
Vol 94 (4) ◽  
pp. 3101-3106 ◽  
Author(s):  
Norikazu Ohtori ◽  
Susumu Okazaki ◽  
Isao Okada
Keyword(s):  
Raman Scattering ◽  
Rotational Relaxation ◽  
Scattering Measurements ◽  
Vibrational And Rotational Relaxation

Raman scattering measurements of vibrational and rotational distributions in expanding nitrogen

1993 ◽  
Author(s):  
WALTER GILLESPIE ◽  
DANIEL BERSHADER ◽  
SURENDRA SHARMA ◽  
STEPHEN RUFFIN
Keyword(s):  
Raman Scattering ◽  
Scattering Measurements

Vibrational and Rotational Relaxation in Sulfur Dioxide

1971 ◽  
Vol 54 (2) ◽  
pp. 644-647 ◽  
Author(s):  
H. E. Bass ◽  
T. G. Winter ◽  
L. B. Evans
Keyword(s):  
Sulfur Dioxide ◽  
Rotational Relaxation ◽  
Vibrational And Rotational Relaxation

X-Ray and Raman Studies of Interlayer Mixing in SimGem Superlattices

1991 ◽  
Vol 220 ◽  
Author(s):  
R. C. Bowman ◽  
P. M. Adams ◽  
S. J. Chang ◽  
V. Arbet-Engels ◽  
K. L. Wang
Keyword(s):  
Activation Energy ◽  
Raman Scattering ◽  
Vacancy Mechanism ◽  
Strained Si ◽  
X Ray ◽  
Scattering Measurements ◽  
Intensity Changes ◽  
Interface Mixing ◽  
Interdiffusion Coefficients

ABSTRACTInterface mixing between the Ge and Si layers in symmetrically strained SimGem superlattices occurs during post growth thermal anneals. Interdiffusion coefficients were obtained from intensity changes in the low angle superlattice x-ray satellites on samples with nominal periodicities between 1.4nm and 5.6nm. A common activation energy of 3.0±0.1 eV was found. The bulk interdiffusion coefficients for SimGem were derived since measurements were made on samples with different layer thicknesses. Intermixing appears to occur by diffusion of Si atoms into the Ge layers via a vacancy mechanism. Raman scattering measurements support this process as well as the formation of Si1−xGex, alloy layers during the anneals.

X-ray diffraction and Raman scattering measurements on silica xerogels

2002 ◽  
Vol 307-310 ◽  
pp. 135-141 ◽  
Author(s):  
S Caponi ◽  
M Ferrari ◽  
A Fontana ◽  
C Masciovecchio ◽  
A Mermet ◽  
...  
Keyword(s):  
Raman Scattering ◽  
Silica Xerogels ◽  
X Ray Diffraction ◽  
X Ray ◽  
Scattering Measurements
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