RF plasma sputter-type DC-mode heavy negative ion source

1992 ◽  
Author(s):  
H. Tsuji ◽  
J. Ishikawa ◽  
Y. Gotoh ◽  
Y. Okada
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

scholarly journals A high-intensity, RF plasma-sputter negative ion source

1999 ◽  
Author(s):  
G. D. Alton ◽  
R. Lohwasser ◽  
B. Cui ◽  
Y. Bao ◽  
T. Zhang ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma

scholarly journals Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 218-220
Author(s):  
Hiroshi TSUJI ◽  
Yoshio OKAYAMA ◽  
Yoshitaka TOYOTA ◽  
Yasuhito GOTOH ◽  
Junzo ISHIKAWA
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production

Negative‐ion production probability in rf plasma sputter‐type heavy negative‐ion source (abstract)a)

1994 ◽  
Vol 65 (4) ◽  
pp. 1226-1226
Author(s):  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
Yasuyuki Kawabata ◽  
Yasuhito Gotoh
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production ◽  
Production Probability

First result of CRDS system with cesium operation for radiofrequency negative ion source test facility at ASIPP

2021 ◽  
Vol 166 ◽  
pp. 112266
Author(s):  
Lizhen Liang ◽  
Chundong Hu ◽  
Wei Liu ◽  
Jianglong Wei ◽  
Yongjian Xu ◽  
...  
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Test Facility ◽  
Source Test

Characteristics of extracted ion beam from a cesium-free negative ion source using sheet plasma

2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Sheet Plasma
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