Threshold voltage modulation mechanism of AlGaN/GaN metal-insulator-semiconductor high-electron mobility transistors with fluorinated Al2O3 as gate dielectrics
2011 ◽
Vol 50
◽
pp. 110202
◽
2019 ◽
Vol 52
(19)
◽
pp. 195102
◽
2011 ◽
Vol 50
(11R)
◽
pp. 110202
◽
2013 ◽
Vol 52
(8S)
◽
pp. 08JN02
◽
2019 ◽
Vol 52
(48)
◽
pp. 485106
◽
2018 ◽
Vol 36
(4)
◽
pp. 041203
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