Threshold voltage modulation mechanism of AlGaN/GaN metal-insulator-semiconductor high-electron mobility transistors with fluorinated Al2O3 as gate dielectrics

2012 ◽  
Vol 100 (13) ◽  
pp. 133507 ◽  
Author(s):  
Chao Chen ◽  
Xingzhao Liu ◽  
Jihua Zhang ◽  
Benlang Tian ◽  
Hongchuan Jiang ◽  
...  
Sign in / Sign up

Export Citation Format

Share Document