Sheath overlap during very large scale plasma source ion implantation

1998 ◽  
Vol 84 (11) ◽  
pp. 5937-5944 ◽  
Author(s):  
B. P. Cluggish ◽  
C. P. Munson
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

Design of a large-scale plasma source ion implantation experiment

1993 ◽  
Author(s):  
B.P. Wood ◽  
D.J. Rej ◽  
I. Henins ◽  
J.T. Scheuer ◽  
W.A. Reass ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

Design of a Large-Scale Plasma Source Ion Implantation Experiment

1992 ◽  
Vol 279 ◽  
Author(s):  
B. P. Wood ◽  
J. T. Scheuer ◽  
M. A. Nastasi ◽  
R. H. Olsher ◽  
W. A. Reass ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
National Laboratory ◽  
Secondary Electron Emission ◽  
Plasma Source ◽  
Particle In Cell ◽  
Surface Areas ◽  
Weakly Ionized ◽  
Plasma Source Ion Implantation ◽  
Small Targets

ABSTRACTIn Plasma Source Ion Implantation (PSII), a target to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Ions in the plasma are accelerated toward the target and implanted in its surface, thereby modifying the properties of the surface. Experimental results reported in the literature have generally been for small targets. We present here the design of a large-scale PSII experiment being assembled Los Alamos National Laboratory, in which we plan to implant targets with surface areas exceeding 1 m2 to doses of up to 5 × 1017 cm−2. In presenting this design, we use Monte Carlo and particle-in-cell simulations to examine sheath expansion, implant current and dose, secondary electron emission, target sputtering, implant depth, and x-ray emission resulting from secondary electrons hitting the vacuum chamber wall.

scholarly journals First Results from the Los Alamos Plasma Source Ion Implantation Experiment

1993 ◽  
Vol 316 ◽  
Author(s):  
D. J. Rej ◽  
J. R. Conrad ◽  
R. J. Faehl ◽  
R. J. Gribble ◽  
I. Henins ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
Surface Hardness ◽  
Plasma Source ◽  
Plasma Electron ◽  
Los Alamos ◽  
Particle In Cell ◽  
Surface Areas ◽  
Plasma Source Ion Implantation ◽  
First Results

ABSTRACTA new facility is operational at Los Alamos to examine plasma source ion implantation on a large scale. Large workpieces can be treated in a 1.5-m-diameter, 4.6-m-Jong plasma vacuum chamber. Primary emphasis is directed towards improving tribological properties of metal surfaces. First experiments have been performed at 40 kV with nitrogen plasmas. Both coupons and manufactured components, with surface areas up to 4 m2, have been processed. Composition and surface hardness of implanted materials are evaluated. Implant conformality and dose uniformity into practical geometries are estimated with multidimensional particle-in-cell computations of plasma electron and ion dynamics, and Monte Carlo simulations of ion transport in solids.

Recent results in plasma source ion implantation

1992 ◽  
Author(s):  
JOHN CONRAD ◽  
M. ABUZRIBA ◽  
J. BLANCHARD ◽  
D. CHAPEK ◽  
A. CHEN ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

Boron doping of silicon by plasma source ion implantation

1997 ◽  
Vol 93 (2-3) ◽  
pp. 247-253 ◽  
Author(s):  
R.J. Matyi ◽  
D.L. Chapek ◽  
D.P. Brunco ◽  
S.B. Felch ◽  
B.S. Lee
Keyword(s):  
Ion Implantation ◽  
Boron Doping ◽  
Plasma Source ◽  
Plasma Source Ion Implantation
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