Thermal dissociation process of hydrogen atoms in plasma-enhanced chemical vapor deposited silicon nitride films

1998 ◽  
Vol 84 (9) ◽  
pp. 5243-5247 ◽  
Author(s):  
Masahiko Maeda ◽  
Manabu Itsumi
Keyword(s):  
Silicon Nitride ◽  
Thermal Dissociation ◽  
Chemical Vapor ◽  
Hydrogen Atoms ◽  
Dissociation Process ◽  
Silicon Nitride Films ◽  
Chemical Vapor Deposited

Diffusion of hydrogen in low‐pressure chemical vapor deposited silicon nitride films

1990 ◽  
Vol 56 (25) ◽  
pp. 2530-2532 ◽  
Author(s):  
W. M. Arnold Bik ◽  
R. N. H. Linssen ◽  
F. H. P. M. Habraken ◽  
W. F. van der Weg ◽  
A. E. T. Kuiper
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Nitride Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical ◽  
Diffusion Of Hydrogen

Positron annihilation study of low pressure chemical vapor deposited silicon nitride films

1991 ◽  
Vol 59 (14) ◽  
pp. 1687-1689 ◽  
Author(s):  
R. A. Hakvoort ◽  
H. Schut ◽  
A. van Veen ◽  
W. M. Arnold Bik ◽  
F. H. P. M. Habraken
Keyword(s):  
Silicon Nitride ◽  
Positron Annihilation ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Nitride Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical ◽  
Positron Annihilation Study
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