Micro-Raman and photoluminescence investigation of ZnxCd1−xSe thin film under high pressure

1998 ◽  
Vol 84 (9) ◽  
pp. 5198-5201 ◽  
Author(s):  
W. S. Li ◽  
Z. X. Shen ◽  
D. Z. Shen ◽  
X. W. Fan
Keyword(s):  
Thin Film ◽  
High Pressure

Fouling Is the Beginning: Upcycling Biopolymer-Fouled Substrates for Fabricating High-Permeance Thin-Film Composite Polyamide Membranes

2020 ◽  
Author(s):  
Ruobin Dai ◽  
Hongyi Han ◽  
Tianlin Wang ◽  
Jiayi Li ◽  
Chuyang Y. Tang ◽  
...  
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
End Of Life ◽  
Water Purification ◽  
Low Pressure ◽  
Polymeric Membranes ◽  
Membrane Recycling ◽  
Film Composite ◽  
Thin Film Composite ◽  
First Time

Commercial polymeric membranes are generally recognized to have low sustainability as membranes need to be replaced and abandoned after reaching the end of their life. At present, only techniques for downcycling end-of-life high-pressure membranes are available. For the first time, this study paves the way for upcycling fouled/end-of-life low-pressure membranes to fabricate new high-pressure membranes for water purification, forming a closed eco-loop of membrane recycling with significantly improved sustainability.

scholarly journals A Manganin Thin Film Ultra-High Pressure Sensor for Microscale Detonation Pressure Measurement

Sensors ◽  
2018 ◽  
Vol 18 (3) ◽  
pp. 736 ◽  
Author(s):  
Guodong Zhang ◽  
Yulong Zhao ◽  
Yun Zhao ◽  
Xinchen Wang ◽  
Xueyong Wei ◽  
...  
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
Pressure Sensor ◽  
Pressure Measurement ◽  
Detonation Pressure ◽  
Ultra High Pressure

Anomalous Hall Effect of the Co Thin Film Deposited by High-Pressure Magnetron Sputtering

2015 ◽  
Vol 1120-1121 ◽  
pp. 424-428
Author(s):  
C.Y. Zou ◽  
Lai Sen Wang ◽  
Xiang Liu ◽  
Q.F. Zhang ◽  
Jun Bao Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
Magnetron Sputtering ◽  
Hall Effect ◽  
Weak Localization ◽  
Anomalous Hall Effect ◽  
Scaling Relation ◽  
Strong Disorder ◽  
Region Temperature ◽  
Localization Region

In this paper, we studied the dependence of temperature and weak localization (WL) effect on the anomalous Hall effect (AHE) in strong disordered and poorly crystallized metal Co thin film deposited by high-pressure magnetron sputtering. The temperature coefficients of resistivity is positive at high temperatures and becomes negative at low temperatures, which is the typical characteristic of weak localization effect in dirty metal regime due to the strong disorder. The saturation anomalous Hall resistivity (ρAxy) have no scaling relation between ρxy and ρxx in weak localization region with temperature below 50 K. In metal region, temperature ranged from 50 K to 300 K, the relation between ρAxy and ρxxis ρAxy=A+bρ2xx, which indicates that the AHE in this Co thin film is scattering-independence at high temperature. The results also shows that the WL effect have a significant impact on the AHE of the Co thin film at low temperature.

Oxygen Reduction Reaction Activity of Nanocolumnar Pt Thin Film Electrocatalyst Deposited on Carbon Support By High Pressure Sputtering

2020 ◽  
Vol MA2020-02 (53) ◽  
pp. 3859-3859
Author(s):  
Assem Omar Basurrah ◽  
Busra Ergul ◽  
Zhiwei Yang ◽  
Ranjitha Hariharalakshmanan ◽  
Tansel Karabacak
Keyword(s):  
Thin Film ◽  
High Pressure ◽  
Oxygen Reduction Reaction ◽  
Oxygen Reduction ◽  
Carbon Support ◽  
Reduction Reaction ◽  
Oxygen Reduction Reaction Activity
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