Low-Frequency Noise Analysis in HfO[sub 2]∕SiON Gate Stack nMOSFETs with Different Interfacial Layer Thickness

2011 ◽  
Author(s):  
Do-Young Choi ◽  
Rock-Hyun Baek ◽  
Yoon-Ha Jeong ◽  
Jisoon Ihm ◽  
Hyeonsik Cheong
Keyword(s):  
Layer Thickness ◽  
Interfacial Layer ◽  
Noise Analysis ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Gate Stack

Low-frequency Noise Analysis of the Impact of an LaO Cap Layer in HfSiON/Ta2C Gate Stack nMOSFETs

2019 ◽  
Vol 25 (7) ◽  
pp. 237-245 ◽  
Author(s):  
Eddy R. Simoen ◽  
Amal Akheyar ◽  
Erika Rohr ◽  
Abdelkarim Mercha ◽  
C. Claeys
Keyword(s):  
Noise Analysis ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Gate Stack ◽  
Cap Layer ◽  
The Impact
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