Design of the injection beamline for the Californium Rare Isotope Breeder Upgrade electron beam ion source charge breeder

2012 ◽  
Vol 83 (2) ◽  
pp. 02A502 ◽  
Author(s):  
C. A. Dickerson ◽  
B. Mustapha ◽  
S. Kondrashev ◽  
P. N. Ostroumov ◽  
G. Savard ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Rare Isotope ◽  
Charge Breeder

Development of electron beam ion source charge breeder for rare isotopes at Californium Rare Isotope Breeder Upgrade

2012 ◽  
Vol 83 (2) ◽  
pp. 02A902 ◽  
Author(s):  
S. Kondrashev ◽  
C. Dickerson ◽  
A. Levand ◽  
P. N. Ostroumov ◽  
R. C. Pardo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Rare Isotope ◽  
Charge Breeder ◽  
Rare Isotopes

scholarly journals Simulation and design of an electron beam ion source charge breeder for the californium rare isotope breeder upgrade

2013 ◽  
Vol 16 (2) ◽  
Author(s):  
Clayton Dickerson ◽  
Brahim Mustapha ◽  
Alexander Pikin ◽  
Sergey Kondrashev ◽  
Peter Ostroumov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Rare Isotope ◽  
Charge Breeder

Fast and efficient charge breeding of the Californium rare isotope breeder upgrade electron beam ion source

2015 ◽  
Vol 86 (8) ◽  
pp. 083311 ◽  
Author(s):  
P. N. Ostroumov ◽  
A. Barcikowski ◽  
C. A. Dickerson ◽  
A. Perry ◽  
A. I. Pikin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Rare Isotope ◽  
Charge Breeding ◽  
Efficient Charge

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Mass analyzer using electron‐beam‐guiding type ion source

1979 ◽  
Vol 50 (12) ◽  
pp. 1517-1520 ◽  
Author(s):  
Tohru Kishi ◽  
Isao Yamada ◽  
Toshinori Takagi
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Mass Analyzer

Simulations of a Johann/Johansson diffraction spectrometer for x-ray experiments at an electron beam ion source

2013 ◽  
Vol T156 ◽  
pp. 014101 ◽  
Author(s):  
Ł Jabłoński ◽  
P Jagodziński ◽  
D Banaś ◽  
M Pajek
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
X Ray
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