Effects of deposition temperature on the properties of hydrogenated tetrahedral amorphous carbon

1997 ◽  
Vol 82 (9) ◽  
pp. 4566-4576 ◽  
Author(s):  
S. Sattel ◽  
J. Robertson ◽  
H. Ehrhardt
Keyword(s):  
Amorphous Carbon ◽  
Deposition Temperature ◽  
Tetrahedral Amorphous Carbon

Properties of Tetrahedral Amorphous Carbon Deposited by A Filtered Cathodic Vacuum ARC

1996 ◽  
Vol 423 ◽  
Author(s):  
M Chhowalla ◽  
C W Chen ◽  
B Kleinsorge ◽  
J Robertson ◽  
G A J Amaratunga ◽  
...  
Keyword(s):  
Band Gap ◽  
Amorphous Carbon ◽  
Deposition Temperature ◽  
Vacuum Arc ◽  
Ion Energy ◽  
Tetrahedral Amorphous Carbon ◽  
Optical Gap ◽  
Filtered Cathodic Vacuum Arc

AbstractThe properties of a highly sp3 bonded form of amorphous carbon denoted ta-C deposited from a filtered cathodic vacuum arc (FCVA) are described as a function of ion energy and deposition temperature. The sp3 fraction depends strongly on ion energy and reaches 85% at an ion energy of 100 eV. Other properties such as density and band gap vary in a similar fashion, with the optical gap reaching a maximum of 2.3 eV. These films are very smooth with area roughness of order 1 nm. The sp3 fraction falls suddenly to almost zero for deposition above about 200°C.

Evolution of sp2 bonding with deposition temperature in tetrahedral amorphous carbon studied by Raman spectroscopy

2000 ◽  
Vol 76 (11) ◽  
pp. 1419-1421 ◽  
Author(s):  
M. Chhowalla ◽  
A. C. Ferrari ◽  
J. Robertson ◽  
G. A. J. Amaratunga
Keyword(s):  
Raman Spectroscopy ◽  
Amorphous Carbon ◽  
Deposition Temperature ◽  
Tetrahedral Amorphous Carbon

scholarly journals Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
High Power ◽  
Deposition Temperature ◽  
Average Power ◽  
Carbon Films ◽  
Strengthening Effect ◽  
Substrate Bias ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

FCVA-Synthesized Tetrahedral Amorphous Carbon Films for Biomedical Applications

2007 ◽  
Vol 336-338 ◽  
pp. 1577-1580 ◽  
Author(s):  
Chuan Lin Zheng ◽  
Wu Bao Yang ◽  
X. Chang
Keyword(s):  
Amorphous Carbon ◽  
Biomedical Applications ◽  
Pure Titanium ◽  
Carbon Films ◽  
Vacuum Arc ◽  
Negative Bias Voltage ◽  
Tetrahedral Amorphous Carbon ◽  
In Vitro Measurements ◽  
Filtered Cathodic Vacuum Arc

Tetrahedral amorphous carbon (ta-C) films were deposited onto Si(100) wafers by using filtered cathodic vacuum arc technique (FCVA). The influence of the negative bias voltage applied to substrates on film structures was studied by Raman spectroscopy, X-ray photoemission spectroscopy (XPS). The ta-C films showed maximal sp3 fractions 87%, the hardness and elastic modulus of the ta-C film is 72 and 480 GPa, respectively. In vitro measurements of contact angle and platelet adhesion were applied to evaluate the biocompatibility of the ta-C films in comparison with that of NiTi, 316L and pure titanium. The results show that the ta-C films have hydrophobicity and exhibit better hemocompatibility which are very suitable for biomedical applications.

Field emission from tetrahedral amorphous carbon

1998 ◽  
Vol 7 (2-5) ◽  
pp. 656-659 ◽  
Author(s):  
B.S. Satyanarayana ◽  
A. Hart ◽  
W.I. Milne ◽  
J. Robertson
Keyword(s):  
Field Emission ◽  
Amorphous Carbon ◽  
Tetrahedral Amorphous Carbon
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