Thermal power at a substrate during ZnO:Al thin film deposition in a planar magnetron sputtering system

1997 ◽  
Vol 82 (5) ◽  
pp. 2115-2122 ◽  
Author(s):  
R. Wendt ◽  
K. Ellmer ◽  
K. Wiesemann
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thermal Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Planar Magnetron ◽  
Sputtering System

scholarly journals Sputtering System for Thin Film Deposition

Shinku ◽  
1971 ◽  
Vol 14 (6) ◽  
pp. 211-223
Author(s):  
Naokichi HOSOKAWA
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtering System

Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 160 ◽  
pp. 410-417 ◽  
Author(s):  
D.L. Ma ◽  
H.Y. Liu ◽  
Q.Y. Deng ◽  
W.M. Yang ◽  
K. Silins ◽  
...  
Keyword(s):  
Thin Film ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
High Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optimal Target ◽  
Pulsed Magnetron

Thin film deposition by magnetron sputtering and determination of some physical parameters

1989 ◽  
Vol 176 (2) ◽  
pp. 219-226 ◽  
Author(s):  
M.M.D. Ramos ◽  
J.B. Almeida ◽  
M.I.C. Ferreira ◽  
M.P. Dos Santos
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Physical Parameters
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