scholarly journals Oxidation of hydrogen-passivated silicon surfaces by scanning near-field optical lithography using uncoated and aluminum-coated fiber probes

1997 ◽  
Vol 82 (1) ◽  
pp. 49-53 ◽  
Author(s):  
S. Madsen ◽  
S. I. Bozhevolnyi ◽  
K. Birkelund ◽  
M. Müllenborn ◽  
J. M. Hvam ◽  
...  
Keyword(s):  
Near Field ◽  
Optical Lithography ◽  
Silicon Surfaces ◽  
Coated Fiber ◽  
Oxidation Of Hydrogen ◽  
Fiber Probes ◽  
Passivated Silicon

Observation of tip-to-sample heat transfer in near-field optical microscopy using metal-coated fiber probes

2005 ◽  
Vol 86 (20) ◽  
pp. 203109 ◽  
Author(s):  
P. G. Gucciardi ◽  
S. Patanè ◽  
A. Ambrosio ◽  
M. Allegrini ◽  
A. D. Downes ◽  
...  
Keyword(s):  
Heat Transfer ◽  
Optical Microscopy ◽  
Near Field ◽  
Sample Heat ◽  
Coated Fiber ◽  
Fiber Probes

scholarly journals Optimizing the fabrication of aluminum-coated fiber probes and their application to optical near-field lithography

1998 ◽  
Vol 71 (1-4) ◽  
pp. 65-71 ◽  
Author(s):  
S Madsen ◽  
N.C.R Holme ◽  
P.S Ramanujam ◽  
S Hvilsted ◽  
J.M Hvam ◽  
...  
Keyword(s):  
Near Field ◽  
Coated Fiber ◽  
Fiber Probes

Investigation of Light Initiated Oxidation of Hydrogen Passivated Silicon Surfaces: Hx-Si(100) and H-Si(111)(1X1)

2002 ◽  
Vol 716 ◽  
Author(s):  
Kathleen A. Morse ◽  
Piero Pianetta
Keyword(s):  
Photoelectron Spectroscopy ◽  
Wavelength Dependence ◽  
Silicon Surfaces ◽  
Humid Air ◽  
Temperature Oxidation ◽  
Dry Air ◽  
Lighting Conditions ◽  
Oxidation Of Hydrogen ◽  
Ambient Gases ◽  
Passivated Silicon

AbstractThere are factors present in cleanroom air that may lead to contamination prior to processing. These factors need to be better understood in order to meet tomorrow's requirement for atomically clean surfaces prior to gate oxidation. This paper identifies the conditions that initiate room temperature oxidation of fluoride prepared hydrogen passivated silicon surfaces by using X-ray Photoelectron Spectroscopy (XPS). Possible oxidation factors investigated include lighting conditions and ambient gases. Both Hx-Si(100) and H-Si(111)(1X1) surfaces do not oxidize in dark conditions and in 450nm wavelength lighting conditions for both humid and dry air ambients. These surfaces do oxidize in dry air and humid air when the surface is exposed to shorter wavelengths of light. Wavelength dependence for oxidation on both surfaces is confirmed. In addition, the level of oxidation observed depends on the surface orientation in humid air but not in dry air.

Thermal processes in metal-coated fiber probes for near-field experiments

2005 ◽  
Vol 87 (3) ◽  
pp. 033109 ◽  
Author(s):  
A. Ambrosio ◽  
M. Allegrini ◽  
G. Latini ◽  
F. Cacialli
Keyword(s):  
Field Experiments ◽  
Near Field ◽  
Thermal Processes ◽  
Coated Fiber ◽  
Fiber Probes

scholarly journals Optical near‐field lithography on hydrogen‐passivated silicon surfaces

1996 ◽  
Vol 69 (4) ◽  
pp. 544-546 ◽  
Author(s):  
Steen Madsen ◽  
Matthias Müllenborn ◽  
Karen Birkelund ◽  
François Grey
Keyword(s):  
Near Field ◽  
Silicon Surfaces ◽  
Passivated Silicon

Quasi-3D plasmonic coupling scheme for near-field optical lithography and imaging

2015 ◽  
Vol 40 (16) ◽  
pp. 3918 ◽  
Author(s):  
Yuan Wang ◽  
Zhidong Du ◽  
Yongshik Park ◽  
Chen Chen ◽  
Xiang Zhang ◽  
...  
Keyword(s):  
Near Field ◽  
Optical Lithography ◽  
Coupling Scheme ◽  
Plasmonic Coupling
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