Dynamics of collisionless rf plasma sheaths

1997 ◽  
Vol 82 (8) ◽  
pp. 3689-3709 ◽  
Author(s):  
Paul A. Miller ◽  
Merle E. Riley
Keyword(s):  
Rf Plasma ◽  
Plasma Sheaths

Characteristics of single and dual radio-frequency (RF) plasma sheaths

2006 ◽  
Vol 1 (2) ◽  
pp. 178-185 ◽  
Author(s):  
Zhong-ling Dai ◽  
You-nian Wang
Keyword(s):  
Radio Frequency ◽  
Rf Plasma ◽  
Plasma Sheaths

Subharmonics and rf-plasma sheaths

1993 ◽  
Vol 71 (6) ◽  
pp. 863-866 ◽  
Author(s):  
Paul A. Miller ◽  
Louis A. Romero ◽  
Paul D. Pochan
Keyword(s):  
Rf Plasma ◽  
Plasma Sheaths

scholarly journals Analysis of a kinematic model for ion transport in rf plasma sheaths

1992 ◽  
Vol 45 (8) ◽  
pp. 5913-5928 ◽  
Author(s):  
Rida T. Farouki ◽  
Satoshi Hamaguchi ◽  
Manoj Dalvie
Keyword(s):  
Ion Transport ◽  
Kinematic Model ◽  
Rf Plasma ◽  
Plasma Sheaths

Application of the physics of plasma sheaths to the modeling of rf plasma reactors

1986 ◽  
Vol 60 (9) ◽  
pp. 3081-3087 ◽  
Author(s):  
A. Metze ◽  
D. W. Ernie ◽  
H. J. Oskam
Keyword(s):  
Rf Plasma ◽  
Plasma Reactors ◽  
Plasma Sheaths ◽  
Rf Plasma Reactors

Electrical sensors for monitoring rf plasma sheaths

1994 ◽  
Author(s):  
Mark A. Sobolewski ◽  
James K. Olthoff
Keyword(s):  
Rf Plasma ◽  
Plasma Sheaths

Characterization of homoepitaxial diamond films by Electron microscopy

1991 ◽  
Vol 49 ◽  
pp. 880-881
Author(s):  
D.P. Malta ◽  
S.A. Willard ◽  
R.A. Rudder ◽  
G.C. Hudson ◽  
J.B. Posthill ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Surface Defects ◽  
Substrate Surface ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Large Degree ◽  
Rf Plasma ◽  
Semiconducting Diamond

Semiconducting diamond films have the potential for use as a material in which to build active electronic devices capable of operating at high temperatures or in high radiation environments. A major goal of current device-related diamond research is to achieve a high quality epitaxial film on an inexpensive, readily available, non-native substrate. One step in the process of achieving this goal is understanding the nucleation and growth processes of diamond films on diamond substrates. Electron microscopy has already proven invaluable for assessing polycrystalline diamond films grown on nonnative surfaces.The quality of the grown diamond film depends on several factors, one of which is the quality of the diamond substrate. Substrates commercially available today have often been found to have scratched surfaces resulting from the polishing process (Fig. 1a). Electron beam-induced current (EBIC) imaging shows that electrically active sub-surface defects can be present to a large degree (Fig. 1c). Growth of homoepitaxial diamond films by rf plasma-enhanced chemical vapor deposition (PECVD) has been found to planarize the scratched substrate surface (Fig. 1b).

Crystal and Fluid-Like Assemblies in Plasma Sheaths

1997 ◽  
Vol 07 (C4) ◽  
pp. C4-155-C4-165 ◽  
Author(s):  
B. M. Annaratone
Keyword(s):  
Plasma Sheaths
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