Boron Doped p-type Hydrogenated Nanocrystalline Silicon Films Grown by Hot Wire Chemical Vapor Deposition

Mapping Intimacies ◽

10.1063/1.3643596 ◽

2011 ◽

Cited By ~ 1

Author(s):

M. R. Pramod ◽

M. M. Kamble ◽

V. S. Waman ◽

A. M. Funde ◽

V. G. Sathe ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hot Wire ◽

Boron Doped ◽

P Type ◽

Nanocrystalline Silicon Films

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Thermal conductivity of amorphous and nanocrystalline silicon films prepared by hot-wire chemical-vapor deposition

Physical Review B ◽

10.1103/physrevb.96.014206 ◽

2017 ◽

Vol 96 (1) ◽

Cited By ~ 9

Author(s):

B. Jugdersuren ◽

B. T. Kearney ◽

D. R. Queen ◽

T. H. Metcalf ◽

J. C. Culbertson ◽

...

Keyword(s):

Thermal Conductivity ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Hot Wire ◽

Nanocrystalline Silicon Films

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Characterization of Undoped, N- and P-Type Hydrogenated Nanocrystalline Silicon Carbide Films Deposited by Hot-Wire Chemical Vapor Deposition at Low Temperatures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1415 ◽

2007 ◽

Vol 46 (4A) ◽

pp. 1415-1426 ◽

Cited By ~ 46

Author(s):

Shinsuke Miyajima ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Nanocrystalline Silicon Carbide ◽

P Type

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Effects of hydrogen on the growth of nanocrystalline silicon films by electron-beam excited plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287754 ◽

2000 ◽

Vol 88 (11) ◽

pp. 6848-6855 ◽

Cited By ~ 6

Author(s):

Mitsuru Imaizumi ◽

Koji Yamaguchi ◽

Kazuhiko Okitsu ◽

Masafumi Yamaguchi ◽

Tamio Hara ◽

...

Keyword(s):

Electron Beam ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Nanocrystalline Silicon Films

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Optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition

Optical Materials ◽

10.1016/j.optmat.2006.11.042 ◽

2007 ◽

Vol 30 (2) ◽

pp. 238-243 ◽

Cited By ~ 12

Author(s):

Atif Mossad Ali

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.08.038 ◽

2008 ◽

Vol 255 (5) ◽

pp. 2910-2915 ◽

Cited By ~ 12

Author(s):

P.Q. Luo ◽

Z.B. Zhou ◽

K.Y. Chan ◽

D.Y. Tang ◽

R.Q. Cui ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Silicon Thin Films ◽

P Type ◽

Doping Ratio

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Low-temperature (120°C) growth of nanocrystalline silicon films prepared by plasma enhanced chemical vapor deposition from SiCl4/H2 gases: Microstructure characterization

Applied Surface Science ◽

10.1016/j.apsusc.2011.11.068 ◽

2012 ◽

Vol 258 (7) ◽

pp. 3221-3226 ◽

Cited By ~ 13

Author(s):

L. Zhang ◽

J.H. Gao ◽

J.Q. Xiao ◽

L.S. Wen ◽

J. Gong ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Microstructure Characterization ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.116098 ◽

1996 ◽

Vol 68 (10) ◽

pp. 1415-1417 ◽

Cited By ~ 42

Author(s):

Erik Edelberg ◽

Sam Bergh ◽

Ryan Naone ◽

Michael Hall ◽

Eray S. Aydil

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Visible Luminescence ◽

Nanocrystalline Silicon Films

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Effects of Addition of SiF4During Growth of Nanocrystalline Silicon Films Deposited at 100°C by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.6047 ◽

1999 ◽

Vol 38 (Part 1, No. 10) ◽

pp. 6047-6053 ◽

Cited By ~ 13

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Nanocrystalline Silicon Films

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Synthesis of highly conductive boron-doped p-type hydrogenated microcrystalline silicon (μc-Si:H) by a hot-wire chemical vapor deposition (HWCVD) technique

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(00)00219-1 ◽

2000 ◽

Vol 64 (4) ◽

pp. 333-346 ◽

Cited By ~ 36

Author(s):

S.R Jadkar ◽

Jaydeep V Sali ◽

M.G Takwale ◽

D.V Musale ◽

S.T Kshirsagar

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Boron Doped ◽

P Type

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Structural and Optical Properties of Nanocrystalline Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.169 ◽

2002 ◽

Vol 41 (Part 1, No. 1) ◽

pp. 169-175 ◽

Cited By ~ 5

Author(s):

Atif Mossad Ali ◽

Takao Inokuma ◽

Yoshihiro Kurata ◽

Seiichi Hasegawa

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Films ◽

Structural And Optical Properties ◽

Nanocrystalline Silicon Films

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