Mass spectrometric measurements of neutral reactant and product densities during Si etching in a high‐density helical resonator Cl2plasma

1996 ◽  
Vol 79 (12) ◽  
pp. 9353-9360 ◽  
Author(s):  
V. M. Donnelly
2000 ◽  
Vol 34 (21) ◽  
pp. 4496-4503 ◽  
Author(s):  
Ian W. Croudace ◽  
Phillip E. Warwick ◽  
Rex N. Taylor ◽  
Andrew B. Cundy

1987 ◽  
Vol 92 (A8) ◽  
pp. 8827 ◽  
Author(s):  
D. E. Hunton ◽  
A. A. Viggiano ◽  
W. Swider ◽  
John F. Paulson ◽  
C. Sherman

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