Effects of interfacial oxide layers of the electrode metals on the electrical characteristics of organic thin-film transistors with HfO2 gate dielectric
2011 ◽
Vol 50
◽
pp. 01BC04
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Keyword(s):
2019 ◽
Vol 48
(7)
◽
pp. 4491-4497
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2020 ◽
Vol 2
(9)
◽
pp. 2813-2818
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2019 ◽
Vol 7
(19)
◽
pp. 5821-5829
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2013 ◽
Vol 44
(1)
◽
pp. 1236-1238
2011 ◽
Vol 11
(5)
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pp. 4466-4470
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Keyword(s):