Two-dimensional electron gas properties by current-voltage analyses of Al0.86In0.14N/AlN/GaN heterostructures

2011 ◽  
Vol 99 (1) ◽  
pp. 012111 ◽  
Author(s):  
S. Pandey ◽  
B. Fraboni ◽  
D. Cavalcoli ◽  
A. Minj ◽  
A. Cavallini
Author(s):  
Asmae Babaya ◽  
Bri Seddik ◽  
Saadi Adil

This paper is mainly dedicated to understand the phenomena governing the formation of two-dimensional electron gas (2DEG) confined in the quantum well which hold the role of the channel in the high electron density transistors (HEMT) based on AlGaN / GaN heterojunction. The theory takes into account: the crystal structure, the spontaneous and piezoelectric polarization concept, the formation mechanism of two-dimensional electron gas at the AlGaN / GaN interface, the approximate resolution of the Poisson and Schrödinger equations to determine the density of Two-dimensional electron gas after the analytical formula of the current-voltage characteristic is established. Our study is also concerned with the dependence of the two-dimensional electron gas density on the following technological parameters: Aluminum molare fraction, AlGaN layer thickness and AlGaN layer doping, In order to control the influence of these parameters on the device performance. Finally, the current-voltage characteristic which reflects the variation of the drain-source current as a function of the modulation of the gate voltage has been discussed.


1996 ◽  
Vol 69 (7) ◽  
pp. 963-965 ◽  
Author(s):  
J. M. Redwing ◽  
M. A. Tischler ◽  
J. S. Flynn ◽  
S. Elhamri ◽  
M. Ahoujja ◽  
...  

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