Erratum: “Surface chemical reaction of laser ablated aluminum sample for detonation initiation” [J. Appl. Phys. 109, 093510 (2011)]

Chang-hwan Kim; Ardian B. Gojani; Jack J. Yoh

doi:10.1063/1.3606427

Erratum: “Surface chemical reaction of laser ablated aluminum sample for detonation initiation” [J. Appl. Phys. 109, 093510 (2011)]

Journal of Applied Physics ◽

10.1063/1.3606427 ◽

2011 ◽

Vol 110 (3) ◽

pp. 039903

Author(s):

Chang-hwan Kim ◽

Ardian B. Gojani ◽

Jack J. Yoh

Keyword(s):

Chemical Reaction ◽

Detonation Initiation ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Aluminum Sample

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Surface chemical reaction of laser ablated aluminum sample for detonation initiation

Journal of Applied Physics ◽

10.1063/1.3585860 ◽

2011 ◽

Vol 109 (9) ◽

pp. 093510 ◽

Cited By ~ 7

Author(s):

Chang-hwan Kim ◽

Jack J. Yoh

Keyword(s):

Chemical Reaction ◽

Detonation Initiation ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Aluminum Sample

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Detonation Initiation via Surface Chemical Reaction of Laser-Ablated Aluminum Sample

Transactions of the Korean Society of Mechanical Engineers B ◽

10.3795/ksme-b.2012.36.2.197 ◽

2012 ◽

Vol 36 (2) ◽

pp. 197-204

Author(s):

Chang-Hwan Kim ◽

Jai-Ick Yoh

Keyword(s):

Chemical Reaction ◽

Detonation Initiation ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Aluminum Sample

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Surface Chemical Reaction of Laser Ablated Aluminum Sample for Detonation Initiation

28th International Symposium on Shock Waves ◽

10.1007/978-3-642-25688-2_119 ◽

2012 ◽

pp. 789-794

Author(s):

Chang-hwan Kim ◽

Jack J. Yoh

Keyword(s):

Chemical Reaction ◽

Detonation Initiation ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Aluminum Sample

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Pattern formation in a surface chemical reaction with global delayed feedback

Physical Review E ◽

10.1103/physreve.63.066102 ◽

2001 ◽

Vol 63 (6) ◽

Cited By ~ 67

Author(s):

M. Bertram ◽

A. S. Mikhailov

Keyword(s):

Pattern Formation ◽

Chemical Reaction ◽

Delayed Feedback ◽

Surface Chemical ◽

Surface Chemical Reaction

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Inelastic electron tunneling spectroscopy evidence for a surface chemical reaction

Solid State Communications ◽

10.1016/0038-1098(75)90447-0 ◽

1975 ◽

Vol 16 (5) ◽

pp. 663-665 ◽

Cited By ~ 23

Author(s):

D.G. Walmsley ◽

I.W.N. McMorris ◽

N.M.D. Brown

Keyword(s):

Chemical Reaction ◽

Electron Tunneling ◽

Tunneling Spectroscopy ◽

Inelastic Electron ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Inelastic Electron Tunneling Spectroscopy ◽

Inelastic Electron Tunneling ◽

Electron Tunneling Spectroscopy

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Electroviscous effect on pressure driven flow and related heat transfer in microchannels with surface chemical reaction

International Journal of Heat and Mass Transfer ◽

10.1016/j.ijheatmasstransfer.2018.10.113 ◽

2019 ◽

Vol 130 ◽

pp. 813-820 ◽

Cited By ~ 1

Author(s):

Xiaobao Mo ◽

Xuegong Hu

Keyword(s):

Heat Transfer ◽

Chemical Reaction ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Electroviscous Effect ◽

Pressure Driven Flow ◽

Pressure Driven

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Influence of the surface deformability on marangoni instability in a liquid layer with surface chemical reaction

Journal of Colloid and Interface Science ◽

10.1016/0021-9797(92)90112-y ◽

1992 ◽

Vol 148 (1) ◽

pp. 42-55 ◽

Cited By ~ 7

Author(s):

Zhasmina Dimitrova Kozhoukharova ◽

Slavcho Georgiev Slavchev

Keyword(s):

Chemical Reaction ◽

Liquid Layer ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Marangoni Instability

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Comparative characteristics of relative pollution exposure caused by human surface chemical reaction under mixing and displacement ventilation

Building and Environment ◽

10.1016/j.buildenv.2018.01.044 ◽

2018 ◽

Vol 132 ◽

pp. 225-232 ◽

Cited By ~ 3

Author(s):

Jun Wang ◽

Jie Yang ◽

Jiang Yu ◽

Feng Xiong

Keyword(s):

Chemical Reaction ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Displacement Ventilation ◽

Pollution Exposure

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Systematic manipulation of surface chemical reaction on the nanoscale: a novel approach for constructing three-dimensional nanostructuresElectronic supplementary information (ESI) available: experimental details. See http://www.rsc.org/suppdata/cc/b2/b211906d/

Chemical Communications ◽

10.1039/b211906d ◽

2003 ◽

pp. 474-475 ◽

Cited By ~ 12

Author(s):

Xiuzhu Wang ◽

Dejian Zhou ◽

Trevor Rayment ◽

Chris Abell

Keyword(s):

Chemical Reaction ◽

Three Dimensional ◽

Supplementary Information ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Novel Approach ◽

Systematic Manipulation

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Large Etch Rate Enhancement by NO-Induced Surface Chemical Reaction during Chemical Dry Etching of Silicon Oxide in F[sub 2] Remote Plasmas

Journal of The Electrochemical Society ◽

10.1149/1.2472555 ◽

2007 ◽

Vol 154 (4) ◽

pp. D267 ◽

Cited By ~ 8

Author(s):

Y. B. Yun ◽

D. J. Kim ◽

S. M. Park ◽

N.-E. Lee ◽

K. S. Kim ◽

...

Keyword(s):

Chemical Reaction ◽

Etch Rate ◽

Silicon Oxide ◽

Dry Etching ◽

Surface Chemical ◽

Surface Chemical Reaction ◽

Rate Enhancement

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