Large Etch Rate Enhancement by NO-Induced Surface Chemical Reaction during Chemical Dry Etching of Silicon Oxide in F[sub 2] Remote Plasmas

2007 ◽  
Vol 154 (4) ◽  
pp. D267 ◽  
Author(s):  
Y. B. Yun ◽  
D. J. Kim ◽  
S. M. Park ◽  
N.-E. Lee ◽  
K. S. Kim ◽  
...  
Keyword(s):  
Chemical Reaction ◽  
Etch Rate ◽  
Silicon Oxide ◽  
Dry Etching ◽  
Surface Chemical ◽  
Surface Chemical Reaction ◽  
Rate Enhancement

Substrate disorder induced by a surface chemical reaction: the fluorine-silicon interaction

1993 ◽  
Vol 292 (1-2) ◽  
pp. 171-181 ◽  
Author(s):  
C.W. Lo ◽  
P.R. Varekamp ◽  
D.K. Shuh ◽  
T.D. Durbin ◽  
V. Chakarian ◽  
...  
Keyword(s):  
Chemical Reaction ◽  
Surface Chemical ◽  
Surface Chemical Reaction

scholarly journals Plasma Cleaning EM Stages, Specimens, and Columns

1997 ◽  
Vol 5 (4) ◽  
pp. 8-9 ◽  
Author(s):  
Nestor Zaluzec
Keyword(s):  
Electron Microscope ◽  
Chemical Reaction ◽  
Plasma Cleaning ◽  
Surface Chemical ◽  
Years Of Experience ◽  
Ion Milling ◽  
Surface Chemical Reaction ◽  
Probe Current ◽  
Reactive Gas

In my 20 plus years of experience, I have found that nearly every specimen contaminates to some degree (some slower, some faster) in an electron microscope regardless of the manufacturer. Most of this contamination comes from the specimen, and it's magnitude is a function of the sample (metallic, semiconductor, organic, etc.), the method of preparation (electrochemical chemical, microtoming, ion milling, etc.), the microscope conditions, the probe and probe current - plus a number of less well controlled factors. Reactive gas plasmas can fortunately be used to mitigate the contamination process and frequently reduce the problem to negligible levels. Basically, one places the specimen/stage in a “tow energy plasma” where the gas acts like a catalyst for a localized surface chemical reaction, The energy of the plasma breaks weak bonds of the hydrocarbon compounds on the surface which then make these species somewhat volatile so that they can further react with the gas in the plasma.

Mössbauer and magneto-chemical study of solids formed by surface chemical reaction of OH–silica groups with iron diacetylacetonato chloride (C5H7O2)2FeCl

2002 ◽  
Vol 195 (1-4) ◽  
pp. 89-92 ◽  
Author(s):  
V.M. Smirnov ◽  
E.G. Zemtsova ◽  
E.B. Ivanov ◽  
M.G. Osmolowsky ◽  
V.G. Semenov ◽  
...  
Keyword(s):  
Chemical Reaction ◽  
Chemical Study ◽  
Surface Chemical ◽  
Surface Chemical Reaction
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