Effect of negative dc bias voltage on mechanical property ofa‐C:H films deposited in electron cyclotron resonance plasma

1995 ◽  
Vol 78 (2) ◽  
pp. 1394-1396 ◽  
Author(s):  
Kiichiro Kamata ◽  
Tohru Inoue ◽  
Ken‐ichi Sugai ◽  
Hidetoshi Saitoh ◽  
Kazunori Maruyama
Keyword(s):  
Mechanical Property ◽  
Bias Voltage ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Dc Bias ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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