Mono-energetic ion beam acceleration in solitary waves during relativistic transparency using high-contrast circularly polarized short-pulse laser and nanoscale targets

2011 ◽  
Vol 18 (5) ◽  
pp. 053103 ◽  
Author(s):  
L. Yin ◽  
B. J. Albright ◽  
D. Jung ◽  
K. J. Bowers ◽  
R. C. Shah ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Solitary Waves ◽  
Short Pulse ◽  
Ion Beam ◽  
High Contrast ◽  
Circularly Polarized ◽  
Short Pulse Laser

Monochromatic short pulse laser produced ion beam using a compact passive magnetic device

2014 ◽  
Vol 85 (4) ◽  
pp. 043504 ◽  
Author(s):  
S. N. Chen ◽  
M. Gauthier ◽  
D. P. Higginson ◽  
S. Dorard ◽  
F. Mangia ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Ion Beam ◽  
Magnetic Device ◽  
Short Pulse Laser

scholarly journals Collimated ion beam by a tailored target illuminated by an intense short pulse laser

2008 ◽  
Vol 112 (4) ◽  
pp. 042044 ◽  
Author(s):  
S Kawata ◽  
M Nakamura ◽  
Q Kong ◽  
Y Nodera ◽  
N Onuma ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Ion Beam ◽  
Short Pulse Laser

Allowable propagation of short pulse laser beam in a plasma channel and electromagnetic solitary waves

2011 ◽  
Vol 375 (45) ◽  
pp. 4022-4028 ◽  
Author(s):  
Shan Zhang ◽  
Xue-Ren Hong ◽  
Hong-Yu Wang ◽  
Bai-Song Xie
Keyword(s):  
Laser Beam ◽  
Pulse Laser ◽  
Solitary Waves ◽  
Plasma Channel ◽  
Short Pulse ◽  
Pulse Laser Beam ◽  
Short Pulse Laser

Silicon Thinning using Ultra-Short Pulse Laser Ablation

2004 ◽  
Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Sample Preparation ◽  
Pulse Laser ◽  
Pulse Laser Ablation ◽  
Short Pulse ◽  
Special Care ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.

Chromium oxide dissolution in steels via short pulse laser processing

2013 ◽  
Vol 115 (4) ◽  
pp. 1469-1477 ◽  
Author(s):  
Evgeny Kharanzhevskiy ◽  
Sergey Reshetnikov
Keyword(s):  
Pulse Laser ◽  
Chromium Oxide ◽  
Laser Processing ◽  
Short Pulse ◽  
Oxide Dissolution ◽  
Short Pulse Laser
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