Schottky barrier height reduction for metal/n-GaSb contact by inserting TiO2 interfacial layer with low tunneling resistance

2011 ◽  
Vol 98 (17) ◽  
pp. 172106 ◽  
Author(s):  
Ze Yuan ◽  
Aneesh Nainani ◽  
Yun Sun ◽  
J.-Y. Jason Lin ◽  
Piero Pianetta ◽  
...  
Nanoscale ◽  
2019 ◽  
Vol 11 (11) ◽  
pp. 4811-4821 ◽  
Author(s):  
Shan Zheng ◽  
Haichang Lu ◽  
Huan Liu ◽  
Dameng Liu ◽  
John Robertson

We report an effective approach for reducing the Schottky barrier height (SBH) in the source and drain (S/D) contacts of WS2 field-effect transistors (FETs) using an ultrathin Al2O3 interfacial layer between the metal and WS2.


1996 ◽  
Vol 35 (Part 1, No. 2B) ◽  
pp. 1428-1430 ◽  
Author(s):  
Masaaki Onomura ◽  
Shinji Saito ◽  
John Rennie ◽  
Yukie Nishikawa ◽  
Peter J. Parbrook ◽  
...  

1995 ◽  
Author(s):  
M. Onomura ◽  
S. Saito ◽  
J. Rennie ◽  
Y. Nishikawa ◽  
P. J. Parbrook ◽  
...  

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