Monte Carlo simulation of x‐ray spectra in electron probe microanalysis: Comparison of continuum with experiment

1994 ◽  
Vol 76 (11) ◽  
pp. 7180-7187 ◽  
Author(s):  
Z.‐J. Ding ◽  
R. Shimizu ◽  
K. Obori
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Probe Microanalysis ◽  
Electron Probe ◽  
X Ray

Monte Carlo Simulation of Characteristic Secondary Fluorescence in Electron Probe Microanalysis of Homogeneous Samples Using the Splitting Technique

2015 ◽  
Vol 21 (3) ◽  
pp. 753-758 ◽  
Author(s):  
Mauricio Petaccia ◽  
Silvina Segui ◽  
Gustavo Castellano
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Probe Microanalysis ◽  
Electron Probe ◽  
Variance Reduction ◽  
Fluorescence Enhancement ◽  
Radiation Transport ◽  
X Rays ◽  
X Ray ◽  
Secondary Fluorescence

AbstractElectron probe microanalysis (EPMA) is based on the comparison of characteristic intensities induced by monoenergetic electrons. When the electron beam ionizes inner atomic shells and these ionizations cause the emission of characteristic X-rays, secondary fluorescence can occur, originating from ionizations induced by X-ray photons produced by the primary electron interactions. As detectors are unable to distinguish the origin of these characteristic X-rays, Monte Carlo simulation of radiation transport becomes a determinant tool in the study of this fluorescence enhancement. In this work, characteristic secondary fluorescence enhancement in EPMA has been studied by using the splitting routines offered by PENELOPE 2008 as a variance reduction alternative. This approach is controlled by a single parameter NSPLIT, which represents the desired number of X-ray photon replicas. The dependence of the uncertainties associated with secondary intensities on NSPLIT was studied as a function of the accelerating voltage and the sample composition in a simple binary alloy in which this effect becomes relevant. The achieved efficiencies for the simulated secondary intensities bear a remarkable improvement when increasing the NSPLIT parameter; although in most cases an NSPLIT value of 100 is sufficient, some less likely enhancements may require stronger splitting in order to increase the efficiency associated with the simulation of secondary intensities.

Monte Carlo Simulation in Electron Probe Microanalysis. Comparison of Different Simulation Algorithms

2006 ◽  
Vol 155 (1-2) ◽  
pp. 67-74 ◽  
Author(s):  
Francesc Salvat ◽  
Xavier Llovet ◽  
José M. Fernández-Varea ◽  
Josep Sempau
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Probe Microanalysis ◽  
Electron Probe ◽  
Simulation Algorithms

scholarly journals A Model for Characteristic X-Ray Emission in Electron Probe Microanalysis based on the Spherical Harmonic (PN) Method for Electron Transport

2021 ◽  
Author(s):  
Jonas Buenger ◽  
Silvia Richter ◽  
Manuel Torrilhon
Keyword(s):  
Monte Carlo ◽  
Electron Transport ◽  
Electron Probe Microanalysis ◽  
Spherical Harmonic ◽  
Electron Probe ◽  
Material Structure ◽  
X Rays ◽  
Minimum Entropy ◽  
Promising Alternative ◽  
X Ray

Classical k-ratio models, e.g. ZAF and phi(rho z), used in electron probe microanalysis (EPMA) assume a homogeneous or multi-layered material structure, which essentially limits the spatial resolution of EPMA to the size of the interaction volume where characteristic x-rays are produced. We present a new model for characteristic x-ray emission that avoids assumptions on the material structure to not restrict the resolution of EPMA a-priori. Our model bases on the spherical harmonic (PN) approximation of the Boltzmann equation for electron transport in continuous slowing down approximation. PN models have a simple structure, are hierarchical in accuracy and well-suited for efficient adjoint-based gradient computation, which makes our model a promising alternative to classical models in terms of improving the resolution of EPMA in the future. We present results of various test cases including a comparison of the PN model to a minimum entropy moment model as well as Monte-Carlo (MC) trajectory sampling, a comparison of PN-based k-ratios to k-ratios obtained with MC, a comparison with experimental data of electron backscattering yields as well as a comparison of PN and Monte-Carlo based on characteristic X-ray generation in a three-dimensional material probe with fine structures.

Monte-Carlo simulation of intensity ratio Is/Ic from substrate and film to determine the film thickness

1988 ◽  
Vol 46 ◽  
pp. 972-973
Author(s):  
Jin Guangxiang ◽  
Li Jianlin ◽  
Xu Li ◽  
Wu Ziqin
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Film Thickness ◽  
Electron Scattering ◽  
Calibration Curve ◽  
Intensity Ratio ◽  
Electron Probe ◽  
Monte Carlo Calculation ◽  
X Ray

The methods of thickness of film on substrate by electron probe have been published in literatures. It may be carried out simply by constructing a calibration curve from x-ray intensity measurments made on a series of films with known thickness on substrate.Sweeney et al. obtained a calibration curve based on a calcula- tied x-ray Ø(p z). As the calculation of Ø(p z) is difficult, Cockett and Davis, proposed using the experimental Ø(p z) of Castaing and Descamps. Bishop and Poole utilised Ø(p z) established by Monte-Carlo calculation for calibration curve.Huchings' method took into account the different electron scattering and absorption in the film on substrate and the bulk standard.Reuter et al., constructing a curve of Ic/Ib (Ic, intensity of the film on substrate; Ib, intensity of bulk standard) versus electron accelerating voltage E, exterpolate the curve so that Ic/Ib equals to 1, the excited x-ray depth obtained is just equal to the thickness of the film. The thickness of the film can be obtained by the use of an appropiate equation of excited x-ray depth.

PENEPMA: A Monte Carlo Program for the Simulation of X-Ray Emission in Electron Probe Microanalysis

2017 ◽  
Vol 23 (3) ◽  
pp. 634-646 ◽  
Author(s):  
Xavier Llovet ◽  
Francesc Salvat
Keyword(s):  
Monte Carlo ◽  
Electron Probe Microanalysis ◽  
Electron Probe ◽  
General Purpose ◽  
Monte Carlo Program ◽  
Photon Beams ◽  
X Ray ◽  
Electron Photon ◽  
Electron And Photon ◽  
Subroutine Package

AbstractThe Monte Carlo program PENEPMA performs simulations of X-ray emission from samples bombarded with both electron and photon beams. It is based on the general-purpose Monte Carlo simulation package PENELOPE, an elaborate system for the simulation of coupled electron-photon transport in arbitrary materials, and on the geometry subroutine package PENGEOM, which tracks particles through complex material structures defined by quadric surfaces. After a brief description of the interaction models implemented in the simulation subroutines and of the structure and operation of PENEPMA, we provide an overview of the capabilities of the program along with several examples of its application to the modeling of electron probe microanalysis measurements.

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