Origin of the threshold voltage shift of organic thin-film transistors under light illumination

2011 ◽  
Vol 109 (8) ◽  
pp. 084510 ◽  
Author(s):  
Kamol Wasapinyokul ◽  
W. I. Milne ◽  
D. P. Chu
2005 ◽  
Vol 871 ◽  
Author(s):  
Oren Tal ◽  
Yossi Rosenwaks ◽  
Yohai Roichman ◽  
Nir Tessler ◽  
Calvin K. Chan ◽  
...  

AbstractKelvin probe force microscopy was used for extraction of the threshold and the pinch off voltages in organic thin film transistors. The first was determined by direct detection of the charge accumulation onset and the latter by a direct observation of the pinch off region formation. In addition, an effective threshold voltage shift can be extracted from the pinch-off voltage as a function of charge concentration. The dependence of the effective threshold voltage on the gate voltage must be considered when calculating charge carrier concentrations in organic thin film transistors.


Author(s):  
Benjamin King ◽  
Andrew J. Daszczynski ◽  
Nicole A. Rice ◽  
Alexander J. Peltekoff ◽  
Nathan J. Yutronkie ◽  
...  

Micromachines ◽  
2021 ◽  
Vol 12 (3) ◽  
pp. 327
Author(s):  
Je-Hyuk Kim ◽  
Jun Tae Jang ◽  
Jong-Ho Bae ◽  
Sung-Jin Choi ◽  
Dong Myong Kim ◽  
...  

In this study, we analyzed the threshold voltage shift characteristics of bottom-gate amorphous indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs) under a wide range of positive stress voltages. We investigated four mechanisms: electron trapping at the gate insulator layer by a vertical electric field, electron trapping at the drain-side GI layer by hot-carrier injection, hole trapping at the source-side etch-stop layer by impact ionization, and donor-like state creation in the drain-side IGZO layer by a lateral electric field. To accurately analyze each mechanism, the local threshold voltages of the source and drain sides were measured by forward and reverse read-out. By using contour maps of the threshold voltage shift, we investigated which mechanism was dominant in various gate and drain stress voltage pairs. In addition, we investigated the effect of the oxygen content of the IGZO layer on the positive stress-induced threshold voltage shift. For oxygen-rich devices and oxygen-poor devices, the threshold voltage shift as well as the change in the density of states were analyzed.


2015 ◽  
Vol 117 (18) ◽  
pp. 185501 ◽  
Author(s):  
Cong Feng ◽  
Ognian Marinov ◽  
M. Jamal Deen ◽  
Ponnambalam Ravi Selvaganapathy ◽  
Yiliang Wu

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