Plasma chemistry of He/O2/SiH4and He/N2O/SiH4mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide

Mark J. Kushner

doi:10.1063/1.355115

Plasma chemistry of He/O2/SiH4and He/N2O/SiH4mixtures for remote plasma‐activated chemical‐vapor deposition of silicon dioxide

Journal of Applied Physics ◽

10.1063/1.355115 ◽

1993 ◽

Vol 74 (11) ◽

pp. 6538-6553 ◽

Cited By ~ 77

Author(s):

Mark J. Kushner

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Plasma Chemistry ◽

Chemical Vapor ◽

Remote Plasma

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Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition

Vacuum ◽

10.1016/0042-207x(89)90815-4 ◽

1989 ◽

Vol 39 (10) ◽

pp. 981

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma

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Microstructure and interfacial states of silicon dioxide film grown by low temperature remote plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.370893 ◽

1999 ◽

Vol 86 (3) ◽

pp. 1346-1354 ◽

Cited By ~ 19

Author(s):

Young-Bae Park ◽

Shi-Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Silicon Dioxide Film ◽

Interfacial States ◽

Dioxide Film

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Properties of gate quality silicon dioxide films deposited on Si–Ge using remote plasma-enhanced chemical vapor deposition with no preoxidation

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590576 ◽

1999 ◽

Vol 17 (2) ◽

pp. 460 ◽

Cited By ~ 11

Author(s):

R. Sharma ◽

J. L. Fretwell ◽

T. Ngai ◽

S. Banerjee

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Silicon Dioxide Films

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Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575283 ◽

1988 ◽

Vol 6 (3) ◽

pp. 1740-1744 ◽

Cited By ~ 34

Author(s):

Sang S. Kim ◽

D. V. Tsu ◽

G. Lucovsky

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma

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Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.573832 ◽

1986 ◽

Vol 4 (3) ◽

pp. 681-688 ◽

Cited By ~ 190

Author(s):

G. Lucovsky ◽

P. D. Richard ◽

D. V. Tsu ◽

S. Y. Lin ◽

R. J. Markunas

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma

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Effects of chlorine addition on the silicon dioxide properties deposited with remote plasma enhanced chemical vapor deposition at low temperatures

Applied Physics Letters ◽

10.1063/1.113769 ◽

1995 ◽

Vol 66 (25) ◽

pp. 3477-3479 ◽

Cited By ~ 12

Author(s):

Young‐Bae Park ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Low Temperatures ◽

Chemical Vapor ◽

Remote Plasma

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High rate–low temperature deposition of silicon dioxide films by remote plasma enhanced chemical vapor deposition using silicon tetrachloride

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579615 ◽

1995 ◽

Vol 13 (6) ◽

pp. 2924-2929 ◽

Cited By ~ 10

Author(s):

J. C. Alonso ◽

S. J. Ramírez ◽

M. García ◽

A. Ortiz

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Tetrachloride ◽

High Rate ◽

Remote Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition

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Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane

Chemistry of Materials ◽

10.1021/cm00036a007 ◽

1993 ◽

Vol 5 (12) ◽

pp. 1710-1714 ◽

Cited By ~ 12

Author(s):

R. A. Levy ◽

J. M. Grow ◽

G. S. Chakravarthy

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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Visible photoluminescence from silicon nanoclusters embedded in silicon nitride films prepared by remote plasma-enhanced chemical vapor deposition

Physica E Low-dimensional Systems and Nanostructures ◽

10.1016/j.physe.2006.12.047 ◽

2007 ◽

Vol 38 (1-2) ◽

pp. 148-151 ◽

Cited By ~ 6

Author(s):

A. Benami ◽

G. Santana ◽

B.M. Monroy ◽

A. Ortiz ◽

J.C. Alonso ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Nanoclusters ◽

Remote Plasma ◽

Visible Photoluminescence ◽

Silicon Nitride Films

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Chemical Vapor Deposition of Three Aminosilanes on Silicon Dioxide: Surface Characterization, Stability, Effects of Silane Concentration, and Cyanine Dye Adsorption

Langmuir ◽

10.1021/la102447y ◽

2010 ◽

Vol 26 (18) ◽

pp. 14648-14654 ◽

Cited By ~ 133

Author(s):

Feng Zhang ◽

Ken Sautter ◽

Adam M. Larsen ◽

Daniel A. Findley ◽

Robert C. Davis ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Surface Characterization ◽

Dye Adsorption ◽

Chemical Vapor ◽

Cyanine Dye ◽

Silane Concentration

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