Pulsed laser‐induced melting followed by quenching of silicon films

1993 ◽  
Vol 74 (11) ◽  
pp. 6592-6598 ◽  
Author(s):  
T. Sameshima ◽  
S. Usui
Keyword(s):  
Pulsed Laser ◽  
Silicon Films

Pulsed Laser-Induced Amorphization of Silicon Films

1991 ◽  
Vol 235 ◽  
Author(s):  
T. Sameshima ◽  
S. Usui
Keyword(s):  
Grain Size ◽  
Film Thickness ◽  
Silicon Film ◽  
Pulsed Laser ◽  
Temperature Sensing ◽  
Silicon Films ◽  
Molten Silicon ◽  
Quartz Substrates ◽  
Xecl Excimer Laser

ABSTRACTAmorphization of silicon films occurred through homogeneous solidification of molten silicon layers on quartz substrates induced by irradiation with a 30ns-XeCl excimer laser. The crystalline nucleation rate was obtained to be 8×1030m−3s−1. Silicon films were completely amorphized for films thinner than 18nm. Complete amorphizatoin is brought about by reduced grain size and reduced recalescence as the film thickness decreases. Recalescence was observed in situusing transient thermometry with a platinum-temperature-sensing layer when a 15nm-thick silicon film was amorphized.

Pulsed Laser Annealing of Thin Silicon Films

2006 ◽  
Vol 45 (4A) ◽  
pp. 2437-2440 ◽  
Author(s):  
Toshiyuki Sameshima ◽  
Hajime Watakabe ◽  
Nobuyuki Andoh ◽  
Seiichiro Higashi
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Silicon Films ◽  
Pulsed Laser Annealing ◽  
Thin Silicon

Photoluminescence of nanocrystalline silicon films formed by pulsed laser-assisted deposition with the introduction of carbon

2006 ◽  
Vol 40 (4) ◽  
pp. 443-448 ◽  
Author(s):  
É. B. Kaganovich ◽  
I. P. Lisovskiĭ ◽  
É. G. Manoĭlov ◽  
S. A. Zlobjn
Keyword(s):  
Pulsed Laser ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Nanocrystalline Silicon Films

ESR studies of nanocrystalline silicon films obtained by pulsed laser ablation of silicon targets

2004 ◽  
Vol 38 (5) ◽  
pp. 598-602 ◽  
Author(s):  
V. Ya. Bratus ◽  
S. M. Okulov ◽  
É. B. Kaganovich ◽  
I. M. Kizyak ◽  
É. G. Manoilov
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Nanocrystalline Silicon Films

Transient Temperature Profiles in Silicon Films during Pulsed Laser Annealing

1991 ◽  
Vol 30 (Part 1, No. 11A) ◽  
pp. 2664-2672 ◽  
Author(s):  
Kazuhiro Shimizu ◽  
Shigeru Imai ◽  
Osamu Sugiura ◽  
Masakiyo Matsumura
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Silicon Films ◽  
Transient Temperature ◽  
Temperature Profiles ◽  
Pulsed Laser Annealing

Study of Titanium-doped Silicon Films Prepared by Magnetron Sputtering and Nanosecond Pulsed Laser

2018 ◽  
Vol 47 (9) ◽  
pp. 916005
Author(s):  
王凯 WANG Kai ◽  
李晓红 LI Xiao-hong ◽  
张延彬 ZHANG Yan-bing ◽  
温才 WEN Cai ◽  
刘德雄 LIU De-xiong
Keyword(s):  
Magnetron Sputtering ◽  
Pulsed Laser ◽  
Silicon Films ◽  
Nanosecond Pulsed Laser ◽  
Doped Silicon
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