Schottky diodes onn‐type InP with CdOx interfacial layers grown by the adsorption and oxidation method

1992 ◽  
Vol 72 (10) ◽  
pp. 5004-5006 ◽  
Author(s):  
H. Sawatari ◽  
O. Oda
Author(s):  
M.W. Bench ◽  
T.J. Miller ◽  
M.I. Nathan ◽  
C.B. Carter

It has been shown in previous reports that barrier height variations can be achieved in GaAs Schottky diodes grown using molecular beam epitaxy by utilizing a thin epitaxial Si layer (a few monolayers) between the GaAs and the Al contact. The effective barrier height was found to be dependent on the thickness and growth conditions of the Si layer. However, there has remained a question as to the exact nature of the interfacial Si layer. In the present investigation, samples with different Si layer thicknesses (no Si, 6 Å Si, and 20 Å Si, as determined in situ during growth using reflection high energy electron diffraction (RHEED)) were characterized using transmission electron microscopy (TEM) to determine the nature of the Si layers. In the present study, it was also found that the presence of the interfacial Si layers affected the growth orientation and morphology of the Al layers.The layer structures investigated were grown using molecular beam epitaxy in a system described elsewhere.


1988 ◽  
Vol 64 (1) ◽  
pp. 218-224 ◽  
Author(s):  
W. Platen ◽  
H.‐J. Schmutzler ◽  
D. Kohl ◽  
K.‐A. Brauchle ◽  
K. Wolter

Author(s):  
A.M. Letsoalo ◽  
M.E. Lee ◽  
E.O. de Neijs

Semiconductor devices require metal contacts for efficient collection of electrical charge. The physics of these metal/semiconductor contacts assumes perfect, abrupt and continuous interfaces between the layers. However, in practice these layers are neither continuous nor abrupt due to poor nucleation conditions and the formation of interfacial layers. The effects of layer thickness, deposition rate and substrate stoichiometry have been previously reported. In this work we will compare the effects of a single deposition technique and multiple depositions on the morphology of indium layers grown on (100) CdTe substrates. The electrical characteristics and specific resistivities of the indium contacts were measured, and their relationships with indium layer morphologies were established.Semi-insulating (100) CdTe samples were cut from Bridgman grown single crystal ingots. The surface of the as-cut slices were mechanically polished using 5μm, 3μm, 1μm and 0,25μm diamond abrasive respectively. This was followed by two minutes immersion in a 5% bromine-methanol solution.


Author(s):  
Minu Mathew ◽  
Chandra Sekhar Rout

This review details the fundamentals, working principles and recent developments of Schottky junctions based on 2D materials to emphasize their improved gas sensing properties including low working temperature, high sensitivity, and selectivity.


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