Real time spectroscopic ellipsometry characterization of the nucleation of diamond by filament‐assisted chemical vapor deposition

R. W. Collins; Yue Cong; H. V. Nguyen; Ilsin An; K. Vedam; T. Badzian; R. Messier

doi:10.1063/1.350544

Real time spectroscopic ellipsometry characterization of the nucleation of diamond by filament‐assisted chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.350544 ◽

1992 ◽

Vol 71 (10) ◽

pp. 5287-5289 ◽

Cited By ~ 25

Author(s):

R. W. Collins ◽

Yue Cong ◽

H. V. Nguyen ◽

Ilsin An ◽

K. Vedam ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Chemical Vapor

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Real-time optical characterization of heteroepitaxy by organometallic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582323 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1184-1189 ◽

Cited By ~ 14

Author(s):

K. A. Bell ◽

M. Ebert ◽

S. D. Yoo ◽

K. Flock ◽

D. E. Aspnes

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optical Characterization ◽

Organometallic Chemical Vapor Deposition

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In situ studies of the amorphous to microcrystalline transition of hot-wire chemical vapor deposition Si:H films using real-time spectroscopic ellipsometry

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1564037 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1545-1549 ◽

Cited By ~ 5

Author(s):

D. H. Levi ◽

B. P. Nelson ◽

J. D. Perkins ◽

H. R. Moutinho

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

In Situ Studies

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Real Time Spectroscopic Ellipsometry Study on Growth Processes of ZrO[sub 2] Thin Films in Metallorganic Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1388885 ◽

2001 ◽

Vol 148 (9) ◽

pp. C632 ◽

Cited By ~ 6

Author(s):

Takeo Kubota ◽

Nobuyoshi Hara ◽

Katsuhisa Sugimoto

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Chemical Vapor ◽

Growth Processes

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Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/ac1ec1 ◽

2021 ◽

Vol 54 (44) ◽

pp. 445303

Author(s):

W Ravisy ◽

M Richard-Plouet ◽

B Dey ◽

S Bulou ◽

P Choquet ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Real Time ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Critical Thickness ◽

Chemical Vapor ◽

Tio2 Thin Films ◽

Photocatalytic Tio2

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Spectroscopic ellipsometry characterization of ZrO[sub 2] films on Si(100) deposited by high-vacuum-metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1690252 ◽

2004 ◽

Vol 22 (3) ◽

pp. 711 ◽

Cited By ~ 34

Author(s):

Z. Song ◽

B. R. Rogers ◽

N. D. Theodore

Keyword(s):

Chemical Vapor Deposition ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

High Vacuum ◽

Chemical Vapor ◽

Metalorganic Chemical

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Real time optical characterization of gas flow dynamics in high-pressure chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1705589 ◽

2004 ◽

Vol 22 (4) ◽

pp. 1596-1599 ◽

Cited By ~ 8

Author(s):

Vincent Woods ◽

Harald Born ◽

Martin Strassburg ◽

Nikolaus Dietz

Keyword(s):

High Pressure ◽

Chemical Vapor Deposition ◽

Real Time ◽

Vapor Deposition ◽

Gas Flow ◽

Chemical Vapor ◽

Optical Characterization ◽

Flow Dynamics ◽

Pressure Chemical

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Real-time spectroellipsometric characterization of nucleation, islanding, and coalescence behavior of boron films grown by soft x-ray excited chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3368498 ◽

2010 ◽

Vol 28 (3) ◽

pp. 411-418 ◽

Cited By ~ 2

Author(s):

Housei Akazawa

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Vapor Deposition ◽

Chemical Vapor ◽

X Ray

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Chemical vapor deposition growth and characterization of AlGaN nanowires

JOURNAL OF SHENZHEN UNIVERSITY SCIENCE AND ENGINEERING ◽

10.3724/sp.j.1249.2015.06638 ◽

2015 ◽

Vol 32 (6) ◽

pp. 638

Author(s):

Xingmin Cai ◽

Xiaoqiang Su ◽

Fan Ye ◽

Huan Wang ◽

Guangxing Liang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth

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Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

Applied Physics Express ◽

10.35848/1882-0786/ab9a8f ◽

2020 ◽

Vol 13 (7) ◽

pp. 075505

Author(s):

Tomohiro Yamaguchi ◽

Hiroki Nagai ◽

Takanori Kiguchi ◽

Nao Wakabayashi ◽

Takuto Igawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Growth ◽

Α Al2o3

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Chemical Vapor Deposition Synthesis and Characterization of Hollow Carbon Nanospheres with High Specific Capacitance and Excellent Cycling Stability

Journal of Electronic Materials ◽

10.1007/s11664-021-08818-7 ◽

2021 ◽

Author(s):

Mehrdad Teymourzadeh ◽

Majid Seifi ◽

Mohammad Bagher Askari

Keyword(s):

Chemical Vapor Deposition ◽

Specific Capacitance ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Specific Capacitance ◽

Synthesis And Characterization ◽

Carbon Nanospheres ◽

Excellent Cycling Stability ◽

Hollow Carbon

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