Effects of plasma and/or 193 nm excimer‐laser irradiation in chemical‐vapor deposition of boron films from B2H6+He

1992 ◽  
Vol 71 (11) ◽  
pp. 5654-5664 ◽  
Author(s):  
Shojiro Komatsu ◽  
Mitsuo Kasamatsu ◽  
Kawakatsu Yamada ◽  
Yusuke Moriyoshi
Keyword(s):  
Chemical Vapor Deposition ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Excimer Laser Irradiation ◽  
193 Nm

scholarly journals Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation

Micromachines ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 88 ◽  
Author(s):  
Kunsik An ◽  
Ho-Nyun Lee ◽  
Kwan Hyun Cho ◽  
Seung-Woo Lee ◽  
David J. Hwang ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Low Temperature ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Polyethylene Naphthalate ◽  
Laser Illumination ◽  
193 Nm

In this study, silicon nitride thin films are deposited on organic polyethylene-naphthalate (PEN) substrates by laser assisted plasma enhanced chemical vapor deposition (LAPECVD) at a low temperature (150 °C) for the purpose of evaluating the encapsulation performance. A plasma generator is placed above the sample stage as conventional plasma enhanced chemical vapor deposition (PECVD) configuration, and the excimer laser beam of 193 nm wavelength illuminated in parallel to the sample surface is coupled to the reaction zone between the sample and plasma source. Major roles of the laser illumination in LAPECVD process are to compete with or complement the plasma decomposition of reactant gases. While a laser mainly decomposes ammonia molecules in the plasma, it also contributes to the photolysis of silane in the plasma state, possibly through the resulting hydrogen radicals and the excitation of intermediate disilane products. It will also be shown that the LAPECVD with coupled laser illumination of 193 nm wavelength improves the deposition rate of silicon nitride thin film, and the encapsulation performance evaluated via the measurement of water vapor transmission rate (WVTR).

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