A study of structural, electrical, and optical properties of low‐pressure chemical vapor deposition tungsten silicide films processed at elevated temperatures

1991 ◽  
Vol 69 (6) ◽  
pp. 3646-3652 ◽  
Author(s):  
Krishna Shenai
2006 ◽  
Vol 100 (1) ◽  
pp. 013524 ◽  
Author(s):  
Zhenrui Yu ◽  
Mariano Aceves-Mijares ◽  
Enrique Quiroga ◽  
R. Lopez-Estopier ◽  
Jesus Carrillo ◽  
...  

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