Mechanically and thermally stable Si‐Ge films and heterojunction bipolar transistors grown by rapid thermal chemical vapor deposition at 900 °C
1990 ◽
Vol 184
(1-2)
◽
pp. 107-115
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1991 ◽
Vol 9
(4)
◽
pp. 2011
◽
1996 ◽
Vol 35
(Part 1, No. 6A)
◽
pp. 3343-3349
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2012 ◽
Vol 51
◽
pp. 04DF01
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2001 ◽
Vol 225
(2-4)
◽
pp. 397-404
◽
2011 ◽
2007 ◽
Vol 298
◽
pp. 852-856
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