Mechanically and thermally stable Si‐Ge films and heterojunction bipolar transistors grown by rapid thermal chemical vapor deposition at 900 °C

1991 ◽  
Vol 69 (2) ◽  
pp. 745-751 ◽  
Author(s):  
M. L. Green ◽  
B. E. Weir ◽  
D. Brasen ◽  
Y. F. Hsieh ◽  
G. Higashi ◽  
...  
Sign in / Sign up

Export Citation Format

Share Document