Deposition of diamondlike films by electron cyclotron resonance microwave plasmas

F. S. Pool; Y. H. Shing

doi:10.1063/1.347094

Deposition of diamondlike films by electron cyclotron resonance microwave plasmas

Journal of Applied Physics ◽

10.1063/1.347094 ◽

1990 ◽

Vol 68 (1) ◽

pp. 62-65 ◽

Cited By ~ 30

Author(s):

F. S. Pool ◽

Y. H. Shing

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Microwave Plasmas ◽

Resonance Microwave

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Nanometer scale fabrication in mercury cadmium telluride using methane/hydrogen electron cyclotron resonance microwave plasmas

Applied Physics Letters ◽

10.1063/1.109390 ◽

1993 ◽

Vol 62 (19) ◽

pp. 2362-2364 ◽

Cited By ~ 17

Author(s):

C. R. Eddy ◽

E. A. Dobisz ◽

C. A. Hoffman ◽

J. R. Meyer

Keyword(s):

Cadmium Telluride ◽

Cyclotron Resonance ◽

Mercury Cadmium Telluride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Nanometer Scale ◽

Microwave Plasmas ◽

Resonance Microwave

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7231. Deposition of diamond-like films by electron cyclotron resonance microwave plasmas

Vacuum ◽

10.1016/0042-207x(91)91038-p ◽

1991 ◽

Vol 42 (8-9) ◽

pp. 574

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Microwave Plasmas ◽

Resonance Microwave

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Silicon carbon alloy thin film depositions using electron cyclotron resonance microwave plasmas

10.1109/pvsc.1990.111873 ◽

2002 ◽

Author(s):

Y.H. Shing ◽

F.S. Pool

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Alloy Thin Film ◽

Microwave Plasmas ◽

Silicon Carbon ◽

Resonance Microwave

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New approach to low temperature deposition of high-quality thin films by electron cyclotron resonance microwave plasmas

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586185 ◽

1992 ◽

Vol 10 (5) ◽

pp. 2170 ◽

Cited By ~ 7

Author(s):

T. T. Chau

Keyword(s):

Thin Films ◽

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Microwave Plasmas ◽

High Quality ◽

New Approach ◽

Temperature Deposition ◽

Resonance Microwave

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Investigation of 4% carbon in hydrogen electron cyclotron resonance microwave plasmas using ethane as the source gas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581982 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2456-2462 ◽

Cited By ~ 4

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Microwave Plasmas ◽

Resonance Microwave

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Boron nitride thin film deposition using electron cyclotron resonance microwave plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578514 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1863-1869 ◽

Cited By ~ 1

Author(s):

S. M. Gorbatkin ◽

R. F. Burgie ◽

W. C. Oliver ◽

J. C. Barbour ◽

T. M. Mayer ◽

...

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Plasmas ◽

Resonance Microwave

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Role of neutral molecule chemistry in electron cyclotron resonance microwave plasmas capable of diamond deposition

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2174028 ◽

2006 ◽

Vol 24 (2) ◽

pp. 643 ◽

Cited By ~ 2

Author(s):

R. Blumenthal ◽

S. F. Webb

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Neutral Molecule ◽

Microwave Plasmas ◽

Diamond Deposition ◽

Resonance Microwave

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Hard boron oxide thin‐film deposition using electron cyclotron resonance microwave plasmas

Applied Physics Letters ◽

10.1063/1.112598 ◽

1994 ◽

Vol 65 (21) ◽

pp. 2672-2674 ◽

Cited By ~ 30

Author(s):

S. M. Gorbatkin ◽

R. L. Rhoades ◽

T. Y. Tsui ◽

W. C. Oliver

Keyword(s):

Thin Film ◽

Boron Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Oxide Thin Film ◽

Microwave Plasmas ◽

Resonance Microwave

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Energy Distribution Functions of Ions Impacted on a Negatively Biased Substrate in an Electron Cyclotron Resonance Microwave Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4393 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4393-4396 ◽

Cited By ~ 3

Author(s):

Yasunori Ohtsu ◽

Keiichi Mori ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Distribution Functions ◽

Electron Cyclotron ◽

Energy Distribution Functions ◽

Resonance Microwave

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Determining the number of chemical steps responsible, for the distribution of molecular species within an electron cyclotron resonance-microwave plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580699 ◽

1997 ◽

Vol 15 (3) ◽

pp. 647-653 ◽

Cited By ~ 6

Author(s):

S. F. Webb ◽

G. A. Gaddy ◽

Rik Blumenthal

Keyword(s):

Molecular Species ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Electron Cyclotron ◽

Resonance Microwave

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