Tunneling‐injection‐induced turnaround behavior of threshold voltage in thermally nitrided oxiden‐channel metal‐oxide‐semiconductor field‐effect transistors
2010 ◽
Vol 49
(8)
◽
pp. 08JC02
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2020 ◽
Vol 19
(4)
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pp. 1478-1484
1995 ◽
Vol 34
(Part 2, No. 8A)
◽
pp. L978-L980
2002 ◽
Vol 41
(Part 2, No. 5B)
◽
pp. L552-L554
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