Tunneling‐injection‐induced turnaround behavior of threshold voltage in thermally nitrided oxiden‐channel metal‐oxide‐semiconductor field‐effect transistors

1990 ◽  
Vol 68 (12) ◽  
pp. 6299-6303 ◽  
Author(s):  
Z. J. Ma ◽  
P. T. Lai ◽  
Z. H. Liu ◽  
S. Fleischer ◽  
Y. C. Cheng
2007 ◽  
Vol 90 (14) ◽  
pp. 143502 ◽  
Author(s):  
C. Z. Zhao ◽  
M. B. Zahid ◽  
J. F. Zhang ◽  
G. Groeseneken ◽  
R. Degraeve ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document