The study of the thermal oxide films on silicon wafers by Fourier transform infrared attenuated total reflection spectroscopy

1990 ◽  
Vol 68 (4) ◽  
pp. 1429-1434 ◽  
Author(s):  
Yoshikatsu Nagasawa ◽  
Ichirou Yoshii ◽  
Kiyomi Naruke ◽  
Kazuhiko Yamamoto ◽  
Hideyuki Ishida ◽  
...  
2010 ◽  
Vol 64 (1) ◽  
pp. 100-103 ◽  
Author(s):  
Samantha A. Hawkins ◽  
Bosoon Park ◽  
Gavin H. Poole ◽  
Timothy Gottwald ◽  
William R. Windham ◽  
...  

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