The study of the thermal oxide films on silicon wafers by Fourier transform infrared attenuated total reflection spectroscopy
2003 ◽
Vol 42
(2)
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pp. 365-365
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2008 ◽
Vol 62
(12)
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pp. 1314-1321
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2010 ◽
Vol 64
(9)
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pp. 1022-1027
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2001 ◽
Vol 235
(1)
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pp. 59-65
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1997 ◽
Vol 15
(4)
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pp. 2153-2157
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2008 ◽
Vol 129
(10)
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pp. 104509
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2003 ◽
Vol 41
(22)
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pp. 2794-2807
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