Photothermal reflectance investigation of processed silicon. I. Room‐temperature study of the induced damage and of the annealing kinetics of defects in ion‐implanted wafers
1979 ◽
Vol 57
(18)
◽
pp. 2350-2354
◽
Keyword(s):
1995 ◽
Vol 53
◽
pp. 224-225
Keyword(s):
1992 ◽
Vol 57
(11)
◽
pp. 2302-2308
Keyword(s):
2007 ◽
Vol 111
(37)
◽
pp. 13957-13966
◽