Excimer laser photolysis study of NH3in the presence of NO at 193 nm

1990 ◽  
Vol 67 (10) ◽  
pp. 6527-6528
Author(s):  
Tetsuya Ikeda ◽  
Minoru Danno ◽  
Hiroshi Makihara
Keyword(s):  
Excimer Laser ◽  
Laser Photolysis ◽  
193 Nm

Photon‐controlled fabrication of amorphous superlattice structures using ArF (193 nm) excimer laser photolysis

1988 ◽  
Vol 52 (22) ◽  
pp. 1868-1870 ◽  
Author(s):  
D. H. Lowndes ◽  
D. B. Geohegan ◽  
D. Eres ◽  
S. J. Pennycook ◽  
D. N. Mashburn ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Photolysis ◽  
Superlattice Structures ◽  
193 Nm

Excimer laser photolysis study of NH3and SO2mixtures at 193 nm

1989 ◽  
Vol 66 (7) ◽  
pp. 3404-3406 ◽  
Author(s):  
Tetsuya Ikeda ◽  
Minoru Danno ◽  
Hiroshi Makihara
Keyword(s):  
Excimer Laser ◽  
Laser Photolysis ◽  
193 Nm

Product yields and mechanism of the excimer laser photolysis of azomethane at 193 nm

1987 ◽  
Vol 91 (2) ◽  
pp. 317-322 ◽  
Author(s):  
James E. Baggott ◽  
Mark. Brouard ◽  
Mary A. Coles ◽  
Andrew. Davis ◽  
Phillip D. Lightfoot ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Photolysis ◽  
Product Yields ◽  
193 Nm

Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

1988 ◽  
Vol 45 (4) ◽  
pp. 361-364 ◽  
Author(s):  
F. Foulon ◽  
E. Fogarassy ◽  
A. Slaoui ◽  
C. Fuchs ◽  
S. Unamuno ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Melting Threshold ◽  
193 Nm
Sign in / Sign up

Export Citation Format

Share Document