Erratum: ‘‘Depth profiling of the minority‐carrier diffusion length in intrinsically gettered silicon by electron‐beam‐induced current’’ [J. Appl. Phys. 63, 1569 (1988)]

1988 ◽  
Vol 64 (6) ◽  
pp. 3330-3330
Author(s):  
C. Donolato ◽  
M. Kittler
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