Enhancement of current peak‐to‐valley ratio in In0.52Al0.48As/In0.53Ga0.47As ‐based resonant tunneling diodes

1988 ◽  
Vol 63 (12) ◽  
pp. 5875-5876 ◽  
Author(s):  
Robert C. Potter ◽  
Amir A. Lakhani ◽  
Dana Beyea ◽  
Harry Hier
1996 ◽  
Vol 68 (6) ◽  
pp. 838-840 ◽  
Author(s):  
T. Schmidt ◽  
M. Tewordt ◽  
R. J. Haug ◽  
K. v. Klitzing ◽  
B. Schönherr ◽  
...  

2000 ◽  
Vol 631 ◽  
Author(s):  
J. G. Fleming ◽  
E. Chow ◽  
S.-Y. Lin

ABSTRACTResonance Tunneling Diodes (RTDs) are devices that can demonstrate very highspeed operation. Typically they have been fabricated using epitaxial techniques and materials not consistent with standard commercial integrated circuits. We report here the first demonstration of SiO2-Si-SiO2 RTDs. These new structures were fabricated using novel combinations of silicon integrated circuit processes.


2021 ◽  
Vol 15 (3) ◽  
Author(s):  
Ignacio Ortega-Piwonka ◽  
Oreste Piro ◽  
José Figueiredo ◽  
Bruno Romeira ◽  
Julien Javaloyes

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