Near‐edge fine‐structure analysis of core‐shell electronic absorption edges in silicon and its refractory compounds with the use of electron‐energy‐loss microspectroscopy

1987 ◽  
Vol 62 (6) ◽  
pp. 2439-2449 ◽  
Author(s):  
W. M. Skiff ◽  
R. W. Carpenter ◽  
S. H. Lin
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