An optimizedinsituargon sputter cleaning process for device quality low‐temperature (T≤800 °C) epitaxial silicon: Bipolar transistor andpnjunction characterization

1987 ◽  
Vol 62 (10) ◽  
pp. 4255-4268 ◽  
Author(s):  
W. R. Burger ◽  
R. Reif
1991 ◽  
Vol 58 (17) ◽  
pp. 1896-1898 ◽  
Author(s):  
T. O. Sedgwick ◽  
P. D. Agnello ◽  
D. Nguyen Ngoc ◽  
T. S. Kuan ◽  
G. Scilla

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