Crystal growth of cubic boron nitride by temperature difference method at ∼55 kbar and ∼1800 °C

1987 ◽  
Vol 61 (8) ◽  
pp. 2822-2825 ◽  
Author(s):  
O. Mishima ◽  
S. Yamaoka ◽  
O. Fukunaga
1989 ◽  
Vol 94 (1) ◽  
pp. 261-269 ◽  
Author(s):  
Makoto Kagamida ◽  
Hisao Kanda ◽  
Minoru Akaishi ◽  
Akihiro Nukui ◽  
Toshikazu Osawa ◽  
...  

1966 ◽  
Vol 69 (3) ◽  
pp. 365-369 ◽  
Author(s):  
Katsuya KUDAKA ◽  
Hiroshi KONNO ◽  
Toshio MATOBA

2015 ◽  
Vol 15 (7) ◽  
pp. 3383-3387 ◽  
Author(s):  
Zhaojun Zhang ◽  
Wei Zheng ◽  
Anqi Chen ◽  
Kai Ding ◽  
Feng Huang

2013 ◽  
Vol 740-742 ◽  
pp. 31-34 ◽  
Author(s):  
Takeshi Yoshikawa ◽  
Sakiko Kawanishi ◽  
Kazuki Morita ◽  
Toshihiro Tanaka

This paper describes the solution growth of SiC by a temperature difference method using an Fe-Si solvent. Crystal growth of SiC from an Fe-40 mol%Si solvent onto a seed wafer of 6H-SiC or 4H-SiC was carried out at 1623 – 1723 K under induction heating. Homo-epitaxial growth on both 6H-SiC and 4H-SiC was identified by Raman spectroscopy, and the SiC growth rate was found to be 90 – 260 μm/h. Experiments were also conducted under resistance heating at 1623 K using conditions which suppressed natural convection. Convective mass transfer in the solution was found to be important for rapid growth of SiC.


1998 ◽  
Vol 15 (1) ◽  
pp. 70-71 ◽  
Author(s):  
Tie-chen Zhang ◽  
San Yu ◽  
Dong-mei Li ◽  
Wei-li Guo ◽  
Chun-xiao Gao ◽  
...  

2004 ◽  
Vol 4 (3) ◽  
pp. 413-414 ◽  
Author(s):  
Songming Wan ◽  
Fan Guo ◽  
Yuangqing Zhang ◽  
Weiwei Zheng ◽  
Yuanguang Zhang ◽  
...  

Author(s):  
D. L. Medlin ◽  
T. A. Friedmann ◽  
P. B. Mirkarimi ◽  
M. J. Mills ◽  
K. F. McCarty

The allotropes of boron nitride include two sp2-bonded phases with hexagonal and rhombohedral structures (hBN and rBN) and two sp3-bonded phases with cubic (zincblende) and hexagonal (wurtzitic) structures (cBN and wBN) (Fig. 1). Although cBN is synthesized in bulk form by conversion of hBN at high temperatures and pressures, low-pressure synthesis of cBN as a thin film is more difficult and succeeds only when the growing film is simultaneously irradiated with a high flux of ions. Only sp2-bonded material, which generally has a disordered, turbostratic microstructure (tBN), will form in the absence of ion-irradiation. The mechanistic role of the irradiation is not well understood, but recent work suggests that ion-induced compressive film stress may induce the transformation to cBN.Typically, BN films are deposited at temperatures less than 1000°C, a regime for which the structure of the sp2-bonded precursor material dictates the phase and microstructure of the material that forms from conventional (bulk) high pressure treatment.


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