scholarly journals Effect of alloy clustering on the high‐temperature electron mobility in In1−xGaxAsyP1−y

1985 ◽  
Vol 58 (3) ◽  
pp. 1410-1411 ◽  
Author(s):  
Pallab K. Bhattacharya ◽  
Joseph W. Ku
1994 ◽  
Vol 339 ◽  
Author(s):  
William J. Schaffer ◽  
G. H. Negley ◽  
K. G. Irvine ◽  
J. W. Palmour

ABSTRACTA measure of the electron mobility anisotropy in n-type 4H and 6H-SiC has been obtained using the Hall effect over the temperature range 80K<T<600K. Hall mobility and resistivity data are collected from appropriately oriented bar patterns fabricated into high quality epitaxial material grown on (1100) or (1120)surfaces having total impurity concentrations 1017-1018 cm-3. The observed mobility ratio for 4H is μ[1120]/[0001] and is independent of temperature. For 6H, the ratio μ[1100]/[0001] decreases from ∼6.2 at 80K to ∼5.0 at 150K and is essentially constant (∼4.8) above 200K. A donor level near 0.6 eV is occasionally observed in 4H which reduces the high temperature electron mobility and introduces an apparent temperature dependence to the mobility ratio if nonuniformly distributed.


1977 ◽  
Vol 48 (8) ◽  
pp. 3621-3622 ◽  
Author(s):  
B. R. Nag ◽  
G. M. Dutta

1991 ◽  
Vol 43 (12) ◽  
pp. 7077-7078
Author(s):  
I. Nagy ◽  
A. Arnau ◽  
P. M. Echenique

2018 ◽  
Vol 11 (9) ◽  
pp. 094101 ◽  
Author(s):  
Yachao Zhang ◽  
Tao Zhang ◽  
Hong Zhou ◽  
Yao Li ◽  
Shengrui Xu ◽  
...  

Carbon ◽  
2020 ◽  
Vol 170 ◽  
pp. 182-190
Author(s):  
Yuliya Mindarava ◽  
Rémi Blinder ◽  
Christian Laube ◽  
Wolfgang Knolle ◽  
Bernd Abel ◽  
...  

2009 ◽  
Vol 52 (12) ◽  
pp. 1879-1884 ◽  
Author(s):  
ZhongFen Zhang ◽  
JinCheng Zhang ◽  
ZhiHao Xu ◽  
HuanTao Duan ◽  
Yue Hao

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