Secondary ion mass spectrometry: Depth profiling of shallow As implants in silicon and silicon dioxide

1984 ◽  
Vol 56 (5) ◽  
pp. 1425-1433 ◽  
Author(s):  
W. Vandervorst ◽  
H. E. Maes ◽  
R. F. De Keersmaecker
Keyword(s):  
Mass Spectrometry ◽  
Silicon Dioxide ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Round-robin test for the measurement of layer thickness of multilayer films by secondary ion mass spectrometry depth profiling

2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Layer Thickness ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Multilayer Films ◽  
Round Robin ◽  
Round Robin Test ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Sputter depth profiling by secondary ion mass spectrometry coupled with sample current measurements

2006 ◽  
Vol 252 (20) ◽  
pp. 7373-7382 ◽  
Author(s):  
U. Bardi ◽  
S.P. Chenakin ◽  
A. Lavacchi ◽  
C. Pagura ◽  
A. Tolstogouzov
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Ion Mass Spectrometry ◽  
Secondary Ion
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