Monoatomic layer removal mechanism in chemical mechanical polishing process: A molecular dynamics study

2010 ◽  
Vol 107 (6) ◽  
pp. 064310 ◽  
Author(s):  
Lina Si ◽  
Dan Guo ◽  
Jianbin Luo ◽  
Xinchun Lu
Keyword(s):  
Molecular Dynamics ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Removal Mechanism ◽  
Polishing Process ◽  
Layer Removal ◽  
Chemical Mechanical Polishing Process

Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface

2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 1897-1902 ◽  
Author(s):  
Toshiyuki Yokosuka ◽  
Katsumi Sasata ◽  
Hitoshi Kurokawa ◽  
Seiichi Takami ◽  
Momoji Kubo ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Chemical Mechanical Polishing ◽  
Quantum Chemical ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Chemical Mechanical Polishing Process ◽  
Quantum Chemical Molecular Dynamics

Ultrafiltration based on various polymeric membranes for recovery of spent tungsten slurry for reuse in chemical mechanical polishing process

2018 ◽  
Vol 548 ◽  
pp. 232-238 ◽  
Author(s):  
Nur Fatin Amalina Muhammad Sanusi ◽  
Mohd Hizami Mohd Yusoff ◽  
Ooi Boon Seng ◽  
Mohd Sabirin Marzuki ◽  
Ahmad Zuhairi Abdullah
Keyword(s):  
Chemical Mechanical Polishing ◽  
Polymeric Membranes ◽  
Mechanical Polishing ◽  
Polishing Process ◽  
Chemical Mechanical Polishing Process
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